Optical properties of pure and Sn-doped β-Ga2O3 single crystals grown by optical float zone technique

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Journal of Crystal Growth Pub Date : 2024-03-21 DOI:10.1016/j.jcrysgro.2024.127676
P. Vijayakumar , D. Joseph Daniel , M. Suganya , Nguyen Duy Quang , H.J. Kim
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Abstract

High-quality single crystals of both pure and Sn:β-Ga2O3 single crystals were grown using the optical floating zone technique and a comprehensive study of its luminescence and scintillation properties was carried out. The pure and Sn:β-Ga2O3 grown crystals were oriented along (1 0 0) by Laue diffraction pattern and its monoclinic structure was confirmed using a single crystal XRD. X-ray induced luminescence spectrum shows a maximum emission peak at 365 nm. The cut off wavelength was observed around 258 nm and the optical band gap was calculated to be 4.64 eV from UV–Vis-NIR transmission spectroscopy. The room temperature Raman spectra were recorded and the various vibration modes were investigated. Low temperature (10 to 300 K) and high temperature (325 to 675 K) TL measurements were carried out on X-ray irradiated crystals and its TL kinetic parameters such as activation energy (eV) and frequency factor (S) were calculated. Scintillation decay time profiles were measured for both pure and Sn-doped crystals under 137Cs γ-ray excitation. The calculated scintillation light output is 2300 Ph/5.5 Mev for Sn:β-Ga2O3 crystal under α-particle excitation from 241Am radiation source.

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利用光浮区技术生长的纯净和掺杂锡的β-Ga2O3 单晶的光学特性
利用光学浮区技术生长了高质量的纯单晶和 Sn:β-Ga2O3 单晶,并对其发光和闪烁特性进行了全面研究。根据 Laue 衍射图样,生长出的纯晶体和 Sn:β-Ga2O3 晶体沿(1 0 0)方向取向,单晶 XRD 证实了其单斜结构。X 射线诱导发光光谱在 365 纳米波长处显示出最大发射峰。根据紫外-可见-近红外透射光谱计算,光带隙为 4.64 eV。记录了室温拉曼光谱并研究了各种振动模式。对 X 射线辐照晶体进行了低温(10 至 300 K)和高温(325 至 675 K)TL 测量,并计算了其 TL 动力学参数,如活化能(eV)和频率因子(S)。在 137Cs γ 射线激发下,测量了纯晶体和掺锡晶体的闪烁衰减时间曲线。在 241Am 辐射源的 α 粒子激发下,计算得出 Sn:β-Ga2O3 晶体的闪烁光输出为 2300 Ph/5.5 Mev。
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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