FeNi3 nanosheets with multiple defects induced by H+-ion irradiation show enhanced electrocatalytic action during the oxygen evolution reaction

IF 5.9 3区 材料科学 Q2 CHEMISTRY, PHYSICAL FlatChem Pub Date : 2024-03-20 DOI:10.1016/j.flatc.2024.100649
Rongfang Zhang , Caiyun Qi , Xiaoping Gao , Yuying Li , Bo Wang
{"title":"FeNi3 nanosheets with multiple defects induced by H+-ion irradiation show enhanced electrocatalytic action during the oxygen evolution reaction","authors":"Rongfang Zhang ,&nbsp;Caiyun Qi ,&nbsp;Xiaoping Gao ,&nbsp;Yuying Li ,&nbsp;Bo Wang","doi":"10.1016/j.flatc.2024.100649","DOIUrl":null,"url":null,"abstract":"<div><p>The oxygen evolution reaction (OER) is vital in electrocatalytic water-splitting. However, efficient non-precious metal electrocatalysts are required to improve the reaction efficiency. Therefore, this study aims to increase the OER activity of FeNi<sub>3</sub> nanosheets using high-energy H<sup>+</sup>-ion irradiation to create multiple defects. The optimized sample (FeNi<sub>3</sub>-16) achieves a lower overpotential of 260 mV at a current density of 10 mA cm<sup>−2</sup> than its pristine counterpart (FeNi<sub>3</sub>, 320 mV). Density functional theory (DFT) calculations show that the multiple defects in Fe and Ni can synergistically reduce the d-band centres of the Fe and Ni sites, which improves the electron transfer efficiency during the OER. This ion-irradiation technique may be applied to other electrocatalysts for various energy device.</p></div>","PeriodicalId":316,"journal":{"name":"FlatChem","volume":"45 ","pages":"Article 100649"},"PeriodicalIF":5.9000,"publicationDate":"2024-03-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"FlatChem","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2452262724000436","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract

The oxygen evolution reaction (OER) is vital in electrocatalytic water-splitting. However, efficient non-precious metal electrocatalysts are required to improve the reaction efficiency. Therefore, this study aims to increase the OER activity of FeNi3 nanosheets using high-energy H+-ion irradiation to create multiple defects. The optimized sample (FeNi3-16) achieves a lower overpotential of 260 mV at a current density of 10 mA cm−2 than its pristine counterpart (FeNi3, 320 mV). Density functional theory (DFT) calculations show that the multiple defects in Fe and Ni can synergistically reduce the d-band centres of the Fe and Ni sites, which improves the electron transfer efficiency during the OER. This ion-irradiation technique may be applied to other electrocatalysts for various energy device.

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氢离子辐照诱导的具有多重缺陷的 FeNi3 纳米片在氧进化反应中显示出更强的电催化作用
氧进化反应(OER)在电催化分水中至关重要。然而,需要高效的非贵金属电催化剂来提高反应效率。因此,本研究旨在利用高能氢离子辐照来产生多重缺陷,从而提高 FeNi3 纳米片的氧演化活性。与原始样品(FeNi3,320 mV)相比,优化样品(FeNi3-16)在 10 mA cm-2 电流密度下的过电位更低,仅为 260 mV。密度泛函理论(DFT)计算表明,铁和镍中的多重缺陷可协同降低铁和镍位点的 d 带中心,从而提高 OER 过程中的电子转移效率。这种离子辐照技术可应用于各种能源装置的其他电催化剂。
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来源期刊
FlatChem
FlatChem Multiple-
CiteScore
8.40
自引率
6.50%
发文量
104
审稿时长
26 days
期刊介绍: FlatChem - Chemistry of Flat Materials, a new voice in the community, publishes original and significant, cutting-edge research related to the chemistry of graphene and related 2D & layered materials. The overall aim of the journal is to combine the chemistry and applications of these materials, where the submission of communications, full papers, and concepts should contain chemistry in a materials context, which can be both experimental and/or theoretical. In addition to original research articles, FlatChem also offers reviews, minireviews, highlights and perspectives on the future of this research area with the scientific leaders in fields related to Flat Materials. Topics of interest include, but are not limited to, the following: -Design, synthesis, applications and investigation of graphene, graphene related materials and other 2D & layered materials (for example Silicene, Germanene, Phosphorene, MXenes, Boron nitride, Transition metal dichalcogenides) -Characterization of these materials using all forms of spectroscopy and microscopy techniques -Chemical modification or functionalization and dispersion of these materials, as well as interactions with other materials -Exploring the surface chemistry of these materials for applications in: Sensors or detectors in electrochemical/Lab on a Chip devices, Composite materials, Membranes, Environment technology, Catalysis for energy storage and conversion (for example fuel cells, supercapacitors, batteries, hydrogen storage), Biomedical technology (drug delivery, biosensing, bioimaging)
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