Application of helium line intensity ratio spectroscopy to xenon plasma in E×B penning discharge

H. Sekine, A. Diallo, S. Abe, Y. Raitses, Hiroyuki Koizumi
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Abstract

We propose the application of helium line intensity ratio spectroscopy in a low-pressure (0.3 mTorr) xenon E×B discharge at an electron temperature of $\sim$2 eV and a density of 1010-1011 cm-3. We successfully identified the helium atom line emissions at 388.9, 447.1, 501.6, 504.8, and 706.5 nm with helium pressures of up to ~20 mTorr. The measured electron temperature, density, and I-V characteristics of discharge remained almost constant in all helium pressures in the present experiment, indicating the suitability of the helium gas as a diagnostic gas. The results of helium line intensity ratio spectroscopy using the line emissions at 388.9, 447.1, and 504.8 nm showed fair agreement with the Langmuir probe measurement. Considering the trade-off relationship between the disturbance introduced by the helium gas and the signal-to-noise ratio, we conclude that a helium pressure of approximately 4 mTorr (approximately 13 times the partial pressure of xenon) represents the optimal pressure range for the application of the helium LIR method to this xenon plasma. It is found that the use of the line emissions at 501.6 and 706.5 nm result in a significant disturbance in the helium line intensity ratio method due to the radiation trapping effect.
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将氦线强度比光谱学应用于 E×B penning 放电中的氙等离子体
我们提议在电子温度为 2 eV、密度为 1010-1011 cm-3 的低压(0.3 mTorr)氙 E×B 放电中应用氦线强度比光谱法。我们成功地确定了氦原子在 388.9、447.1、501.6、504.8 和 706.5 nm 处的线发射,氦压高达 ~20 mTorr。在本实验中,所测得的电子温度、密度和放电的 I-V 特性在所有氦气压下都几乎保持不变,这表明氦气适合用作诊断气体。利用 388.9、447.1 和 504.8 nm 处的氦线发射光谱进行的氦线强度比光谱分析结果表明,与 Langmuir 探针的测量结果相当吻合。考虑到氦气带来的干扰与信噪比之间的权衡关系,我们得出结论:氦气压力约为 4 mTorr(约为氙气分压的 13 倍)是将氦气线强度比方法应用于该氙等离子体的最佳压力范围。我们发现,由于辐射捕获效应,使用 501.6 和 706.5 nm 处的线发射会对氦线强度比方法造成严重干扰。
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