Bipolar Plasticity in Synaptic Transistors: Utilizing HfSe2 Channel with Direct-Contact HfO2 Gate Dielectrics

Jie Lu, Zeyang Xiang, Kexiang Wang, Mengrui Shi, Liuxuan Wu, Fuyu Yan, Ranping Li, Zixuan Wang, Huilin Jin, Ran Jiang
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引用次数: 1

Abstract

The investigation of dual-mode synaptic plasticity was conducted in thin-film transistors (TFTs) featuring an HfSe2 channel, coupled with an oxygen-deficient (OD)-HfO2 layer structure. In these transistors, the application of negative gate pulses resulted in a notable increase in the post-synaptic current, while positive pulses led to a decrease. This distinctive response can be attributed to the dynamic interplay of charge interactions, significantly influenced by the ferroelectric characteristics of the OD-HfO2 layer. The findings from this study highlight the capability of this particular TFT configuration in closely mirroring the intricate functionalities of biological neurons, paving the way for advancements in bio-inspired computing technologies.
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突触晶体管中的双极可塑性:利用 HfSe2 沟道和直接接触式 HfO2 栅极电介质
我们在具有 HfSe2 沟道和缺氧(OD)-HfO2 层结构的薄膜晶体管(TFT)中对双模式突触可塑性进行了研究。在这些晶体管中,施加负栅极脉冲会导致突触后电流显著增加,而正脉冲则会导致突触后电流减少。这种独特的反应可归因于电荷相互作用的动态交互作用,而这种交互作用在很大程度上受到 OD-HfO2 层铁电特性的影响。这项研究的结果凸显了这种特殊 TFT 配置在密切反映生物神经元复杂功能方面的能力,为生物启发计算技术的进步铺平了道路。
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