{"title":"Silicotungstic acid supported on Bi-based MOF-derived metal oxide for photodegradation of organic dyes","authors":"Qiuyun Zhang, Linmin Luo, Yanhui Lei, Feiran Xie, Weihua Li, Yongting Zhao, Jialu Wang, Yutao Zhang","doi":"10.1515/gps-2023-0193","DOIUrl":null,"url":null,"abstract":"\n In this article, Bi-based metal–organic framework-supported silicotungstic acid (STA) was synthesized by a simple hydrothermal method and used as a precursor for the preparation of the Bi-based MOF-derived catalyst (STA@C-Bi-BDC). Using a combination of FTIR, XRD, SEM-EDS, N2 adsorption–desorption, TG, UV-Vis DRS, and XPS techniques, the successful immobilization of STA groups on Bi-MOF-derived C-Bi-BDC was assessed. Furthermore, the photocatalytic performance of the as-prepared catalysts was investigated in the degradation of the RhB dye process under visible light. Within 120 min of visible light exposure, the high degradation rate of RhB (92.7%) by STA@C-Bi-BDC system was achieved, which was a lot larger than the STA (39.4%), C-Bi-BDC (59.2%), and STA@Bi-BDC (74.0%) system, and cyclic experiments exhibit that the STA@C-Bi-BDC is a relatively stable photocatalyst. More importantly, the catalyst shows high applicability for the degradation of other dyes. This study reveals a comprehensive strategy for the design of efficient Bi-based MOF-derived photocatalyst for organic dye-based wastewater treatment.","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"281 1","pages":""},"PeriodicalIF":4.7000,"publicationDate":"2024-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1515/gps-2023-0193","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In this article, Bi-based metal–organic framework-supported silicotungstic acid (STA) was synthesized by a simple hydrothermal method and used as a precursor for the preparation of the Bi-based MOF-derived catalyst (STA@C-Bi-BDC). Using a combination of FTIR, XRD, SEM-EDS, N2 adsorption–desorption, TG, UV-Vis DRS, and XPS techniques, the successful immobilization of STA groups on Bi-MOF-derived C-Bi-BDC was assessed. Furthermore, the photocatalytic performance of the as-prepared catalysts was investigated in the degradation of the RhB dye process under visible light. Within 120 min of visible light exposure, the high degradation rate of RhB (92.7%) by STA@C-Bi-BDC system was achieved, which was a lot larger than the STA (39.4%), C-Bi-BDC (59.2%), and STA@Bi-BDC (74.0%) system, and cyclic experiments exhibit that the STA@C-Bi-BDC is a relatively stable photocatalyst. More importantly, the catalyst shows high applicability for the degradation of other dyes. This study reveals a comprehensive strategy for the design of efficient Bi-based MOF-derived photocatalyst for organic dye-based wastewater treatment.
期刊介绍:
ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric.
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