Fully Vertical GaN-on-SiC p-i-n Diodes With BFOM of 2.89 GW/cm2

IF 4.6 Q2 MATERIALS SCIENCE, BIOMATERIALS ACS Applied Bio Materials Pub Date : 2024-04-10 DOI:10.1109/JEDS.2024.3386857
Jialun Li;Renqiang Zhu;Ka Ming Wong;Kei May Lau
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Abstract

This letter reports a high-performance fully-vertical GaN-on-SiC p-i-n diode enabled by a conductive n-AlGaN buffer. The buffer conductivity was optimized by tuning the Al composition. The diode presents an ultra-low specific ON-resistance of 0.25 $\text{m}\Omega \cdot $ cm2, a high current swing of 1011, and a high breakdown voltage of 850 V with a 5- $\mu \text{m}$ -thick drift layer, leading to a Baliga’s figure of merit (BFOM) of 2.89 GW/cm2. The diode performance at elevated temperatures and the OFF-state leakage mechanism are analyzed. The demonstrated fully-vertical GaN-on-SiC p-i-n diode with a conductive buffer reveals a simple way towards realizing high-performance fully-vertical GaN-on-SiC devices for high power applications.
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BFOM 为 2.89 GW/cm2 的全垂直硅基氮化镓 pi-n 二极管
这封信报告了通过导电 nAlGaN 缓冲区实现的高性能全垂直硅基氮化镓 pi-n 二极管。通过调整铝的成分优化了缓冲器的电导率。该二极管具有 0.25 $\text{m}\Omega \cdot $ cm2 的超低比导通电阻、1011 的高电流摆幅和 850 V 的高击穿电压,漂移层厚度为 5- $\mu \text{m}$,巴利加优点系数 (BFOM) 为 2.89 GW/cm2。对二极管在高温下的性能和关态漏电机制进行了分析。所展示的带有导电缓冲器的全垂直硅基氮化镓 pi-n 二极管揭示了一种实现高性能全垂直硅基氮化镓器件的简单方法,适用于高功率应用。
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来源期刊
ACS Applied Bio Materials
ACS Applied Bio Materials Chemistry-Chemistry (all)
CiteScore
9.40
自引率
2.10%
发文量
464
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