Spacer effects on the performance of MoTe2/MoSe2 and MoTe2/WSe2 heterostructure double gate MOSFET

IF 2.7 Q2 PHYSICS, CONDENSED MATTER Micro and Nanostructures Pub Date : 2024-04-13 DOI:10.1016/j.micrna.2024.207846
M. Muthu Manjula, R. Ramesh
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Abstract

In this work, the spacer effects (both low and high-k) on the dc and noise characteristics of heterostructure molybdenum ditelluride (MoTe2/MoSe2 and MoTe2/WSe2) double gate (DG) MOSFET is analyzed. To study the device characteristics, a hybrid methodology that uses both QuantumWise ATK and Sentaurus TCAD tool is used. The performance metrics of the device such as on-current (Ion), Ion/Ioff ratio, subthreshold swing (SS), threshold voltage are obtained. The noise performance of the device is also studied (with/without spacer) using impedance field method. Noise parameters such as noise power spectral density (SID) and noise figure (function of both frequency and bias) has also been simulated and noise components such as G-R noise, flicker noise and white noise are obtained. The simulation results shows that the introduction of spacer material enhances the dc performance of the device and influences its noise characteristics.

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间隔物对 MoTe2/MoSe2 和 MoTe2/WSe2 异质结构双栅 MOSFET 性能的影响
本研究分析了间隔效应(低和高 K)对异质结构二碲化钼(MoTe2/MoSe2 和 MoTe2/WSe2)双栅 MOSFET 的直流和噪声特性的影响。为了研究器件特性,采用了一种混合方法,同时使用 QuantumWise ATK 和 Sentaurus TCAD 工具。获得了器件的性能指标,如导通电流(Ion)、Ion/Ioff 比、亚阈值摆幅(SS)和阈值电压。此外,还使用阻抗场方法研究了该器件的噪声性能(有/无隔板)。还模拟了噪声功率谱密度(SID)和噪声系数(频率和偏置的函数)等噪声参数,并获得了 G-R 噪声、闪烁噪声和白噪声等噪声成分。仿真结果表明,间隔材料的引入增强了器件的直流性能,并影响了其噪声特性。
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