Electron power absorption in CF4 capacitively coupled RF plasmas operated in the striation mode

R. Masheyeva, M. Vass, Xiao-Kun Wang, Yong-Xin Liu, A. Derzsi, Peter Hartmann, J. Schulze, Zoltán Donkó
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Abstract

The electron power absorption mechanisms in electronegative capacitively coupled plasmas in CF4 are investigated using PIC/MCC simulations at a pressure of p=60 Pa, a driving frequency of f= 13.56 MHz for voltage amplitudes in the interval of Φ0=100...300 V, where pronounced self-organized density variations, i.e., striations, develop. The calculations are based on the Boltzmann Term Analysis, a computational diagnostic method capable of providing a complete spatio-temporal description of electron power absorption. The discharge undergoes an electron power absorption mode transition from the drift-ambipolar- to the striation-mode at Φ0=180 V. Although Ohmic power absorption is found to be the dominant electron power absorption mechanism in the parameter range considered, the electron power absorption mode transition can be inferred from the behaviour of the spatio-temporally averaged ambipolar power absorption as a function of the voltage amplitude. Furthermore, it is shown, that as a consequence of the presence of striations, the temporal modulation of the electron density leads to a temporal modulation of the ambipolar electric field, which is responsible for the striated structures of various physical quantities related to electrons, such as the electron temperature and the ionization source function.
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以条纹模式运行的 CF4 电容耦合射频等离子体中的电子功率吸收
利用PIC/MCC模拟研究了CF4负电容耦合等离子体中的电子功率吸收机制,压力为p=60 Pa,驱动频率为f=13.56 MHz,电压幅值范围为Φ0=100...300 V,其中出现了明显的自组织密度变化,即条纹。计算基于波尔兹曼项分析法,这是一种计算诊断方法,能够提供完整的电子功率吸收时空描述。尽管在所考虑的参数范围内,欧姆功率吸收被认为是最主要的电子功率吸收机制,但电子功率吸收模式的转变可以从作为电压振幅函数的时空平均伏极性功率吸收的行为中推断出来。此外,研究还表明,由于条纹的存在,电子密度的时域调制导致了伏极电场的时域调制,这是与电子有关的各种物理量(如电子温度和电离源函数)出现条纹结构的原因。
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