HASPIDE: a project for the development of hydrogenated amorphous silicon radiation sensors on a flexible substrate

L. Tosti, L. Antognini, S. Aziz, A. Bashiri, L. Calcagnile, D. Caputo, A. Caricato, R. Catalano, G. De Cesare, D. Chilà, G. Cirrone, T. Croci, G. Cuttone, S. Dunand, M. Fabi, L. Frontini, C. Grimani, M. Ionica, K. Kanxheri, M. Large, V. Liberali, N. Lovecchio, M. Martino, G. Maruccio, G. Mazza, M. Menichelli, A. Monteduro, A. Morozzi, F. Moscatelli, A. Nascetti, S. Pallotta, D. Passeri, M. Pedio, M. Petasecca, G. Petringa, F. Peverini, L. Piccolo, P. Placidi, G. Quarta, S. Rizzato, F. Sabbatini, L. Servoli, A. Stabile, C. Talamonti, J. Thomet, M. Villani, R. Wheadon, N. Wyrsch, N. Zema
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Abstract

Hydrogenated amorphous silicon (a-Si:H) is a material with a very good radiation hardness and with the possibility of deposition on flexible substrates like Polyimide (PI). Exploiting these properties, the HASPIDE (Hydrogenated Amorphous Silicon PIxels DEtectors) project has the goal of developing a-Si:H detectors on flexible substrates for beam dosimetry and profile monitoring, neutron detection and space experiments. The detectors for this experiment will be developed in two different structures: the n-i-p diode structure, which has been used up to now for the construction of the planar a-Si:H detectors, and the recently developed charge selective contact structure. In the latter the doped layers (n or p) are replaced with charge selective materials namely electron-selective conductive metal-oxides (TiO2 or Al:ZnO) and hole-selective conductive metal oxides (MoO x ). In this paper preliminary data on the capabilities of these detectors to measure X-ray and electron fluxes will be presented. In particular, the linearity, the sensitivity, the stability and dark current in various conditions will be discussed.
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HASPIDE:在柔性衬底上开发氢化非晶硅辐射传感器的项目
氢化非晶硅(a-Si:H)是一种辐射硬度非常高的材料,可以沉积在聚酰亚胺(PI)等柔性基板上。利用这些特性,HASPIDE(氢化非晶硅探测器)项目的目标是在柔性基板上开发 a-Si:H 探测器,用于光束剂量测定和剖面监测、中子探测和空间实验。该实验的探测器将采用两种不同的结构:一种是 ni-p 二极管结构,这种结构迄今一直用于制造平面 a-Si:H 探测器;另一种是最近开发的电荷选择性接触结构。在后者中,掺杂层(n 或 p)被电荷选择性材料取代,即电子选择性导电金属氧化物(TiO2 或 Al:ZnO)和空穴选择性导电金属氧化物(MoO x)。本文将介绍这些探测器测量 X 射线和电子通量能力的初步数据。特别是将讨论在各种条件下的线性度、灵敏度、稳定性和暗电流。
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