{"title":"A Comparative Study on the Effects of Planarity of Access Region on the Low-Frequency Noise Performance of InAlN/GaN HFETs","authors":"Yatexu Patel;Pouya Valizadeh","doi":"10.1109/JEDS.2024.3392174","DOIUrl":null,"url":null,"abstract":"The low frequency drain noise-current characteristics of metallic-face InAlN/AlN/GaN heterostructure field effect transistors (HFETs) having fin structures only under the gate, while maintaining a planar structure in the access regions, are compared to those of the HFETs having fin structures stretched from source to drain. Evidence indicates that both device types follow the trends of carrier number fluctuation (CNF) with correlated mobility fluctuation (CMF) model of 1/f noise. Accordingly, the noise of the gated channel has been identified as the dominant noise source for both device types. Devices from the former category exhibit improved 1/f noise performance with lower drain noise-current spectral density. This observation could be due to presence of a higher two-dimensional electron gas (2DEG) concentration under the gated-channel overshadowing the carrier number and mobility fluctuations.","PeriodicalId":13210,"journal":{"name":"IEEE Journal of the Electron Devices Society","volume":null,"pages":null},"PeriodicalIF":2.0000,"publicationDate":"2024-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10506227","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Journal of the Electron Devices Society","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10506227/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The low frequency drain noise-current characteristics of metallic-face InAlN/AlN/GaN heterostructure field effect transistors (HFETs) having fin structures only under the gate, while maintaining a planar structure in the access regions, are compared to those of the HFETs having fin structures stretched from source to drain. Evidence indicates that both device types follow the trends of carrier number fluctuation (CNF) with correlated mobility fluctuation (CMF) model of 1/f noise. Accordingly, the noise of the gated channel has been identified as the dominant noise source for both device types. Devices from the former category exhibit improved 1/f noise performance with lower drain noise-current spectral density. This observation could be due to presence of a higher two-dimensional electron gas (2DEG) concentration under the gated-channel overshadowing the carrier number and mobility fluctuations.
期刊介绍：
The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.
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