Towards Atomic Scale Quantum Dots in Silicon: An Ultra-Efficient and Robust Subtractor Using Proposed P-Shaped Pattern

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Nanotechnology Pub Date : 2024-03-08 DOI:10.1109/TNANO.2024.3398560
Hadi Rasmi;Mohammad Mosleh;Nima Jafari Navimipour;Mohammad Kheyrandish
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Abstract

Today, Complementary Metal-Oxide-Semiconductor (CMOS) technology faces critical challenges, such as power consumption and current leakage at the nanoscale. Therefore, Atomic Silicon Dangling Bond (ASDB) technology has been proposed as one of the best candidates to replace CMOS technology; due to its high-speed switching and low power consumption. Among the most important issues in ASDB nanotechnology, output stability and robustness against possible faults may be focused. This paper first introduces a novel P-shaped pattern in ASDB, for designing stable and robust primitive logic gates, including AND, NAND, OR, NOR and XOR. Then, two combinational circuits, half-subtractor and full-subtractor, are proposed by the proposed ASDB gates. The simulation results show high output stability as well as adequate robustness, against various defects obtained by the proposed designs; on average, they have improvements of more than 56% and 62%, against DB omission defects and extra cell deposition defects; respectively. Also, the results of the investigations show that the proposed circuits have been improved by 65%, 21% and 2%, in terms of occupied area, energy and occurrence, respectively; compared to the previous works.
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在硅中实现原子级量子点:使用 P 形图案的超高效稳健减法器
如今,互补金属氧化物半导体(CMOS)技术面临着严峻的挑战,如功耗和纳米级漏电流。因此,原子硅悬浮键(ASDB)技术因其高速开关和低功耗的特点,被认为是取代 CMOS 技术的最佳候选技术之一。在 ASDB 纳米技术最重要的问题中,输出稳定性和对可能出现的故障的鲁棒性可能是重点。本文首先介绍了 ASDB 中一种新颖的 P 形图案,用于设计稳定而坚固的原始逻辑门,包括 AND、NAND、OR、NOR 和 XOR。然后,利用所提出的 ASDB 逻辑门设计了两个组合电路,即半减法器和全减法器。仿真结果表明,针对各种缺陷,所提出的设计具有较高的输出稳定性和足够的鲁棒性;针对 DB 遗漏缺陷和额外单元沉积缺陷,它们的平均改进率分别超过了 56% 和 62%。此外,研究结果表明,与之前的研究相比,所提出的电路在占用面积、能量和发生率方面分别提高了 65%、21% 和 2%。
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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