Pankaj Mahawar, M. Praveena, Shreyanil Bhuyan, Dipin S. Pillai, Sivasurender Chandran
{"title":"Pattern Formation in Evaporating Polymer Solutions─Interplay between Dewetting and Decomposition","authors":"Pankaj Mahawar, M. Praveena, Shreyanil Bhuyan, Dipin S. Pillai, Sivasurender Chandran","doi":"10.1021/acspolymersau.4c00018","DOIUrl":null,"url":null,"abstract":"Pattern formation during solution evaporation is common in several industrial settings and involves a complex interplay of multiple processes, including wetting/dewetting, diffusion, and rheological characteristics of the solution. Monitoring the emergence of patterns during evaporation under controlled conditions may allow deconvolution of different processes and, in turn, improve our understanding of this common yet complex phenomenon. Here, we probe the importance of initial conditions, defined by the solution concentration <i>c</i><sub>0</sub>, on the pattern formation in evaporating polymer solutions on the air–water interface. Intriguingly, the initial decrease in the lateral length scale (ξ), characterizing the patterns, takes an upturn at higher concentrations, revealing reentrant behavior. We employ a gradient dynamics model consisting of coupled evolution equations for the film height and the polymer fraction in the solution. Our simulations capture two different length scales revealing the reasons underlying the re-entrant behavior of ξ(<i>c</i><sub>0</sub>). While the long-range destabilizing interactions between suspension and water result in the dewetting of thin film solutions, the phase separation between the polymer and solvent occurs at shorter length scales. Our results demonstrate the importance of initial concentration on pattern formation and, thereby, on the resultant properties of thin polymer films.","PeriodicalId":72049,"journal":{"name":"ACS polymers Au","volume":"66 1","pages":""},"PeriodicalIF":4.7000,"publicationDate":"2024-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS polymers Au","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1021/acspolymersau.4c00018","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
引用次数: 0
Abstract
Pattern formation during solution evaporation is common in several industrial settings and involves a complex interplay of multiple processes, including wetting/dewetting, diffusion, and rheological characteristics of the solution. Monitoring the emergence of patterns during evaporation under controlled conditions may allow deconvolution of different processes and, in turn, improve our understanding of this common yet complex phenomenon. Here, we probe the importance of initial conditions, defined by the solution concentration c0, on the pattern formation in evaporating polymer solutions on the air–water interface. Intriguingly, the initial decrease in the lateral length scale (ξ), characterizing the patterns, takes an upturn at higher concentrations, revealing reentrant behavior. We employ a gradient dynamics model consisting of coupled evolution equations for the film height and the polymer fraction in the solution. Our simulations capture two different length scales revealing the reasons underlying the re-entrant behavior of ξ(c0). While the long-range destabilizing interactions between suspension and water result in the dewetting of thin film solutions, the phase separation between the polymer and solvent occurs at shorter length scales. Our results demonstrate the importance of initial concentration on pattern formation and, thereby, on the resultant properties of thin polymer films.