Modification induced by electronic excitation in CoFe2O4 thin films: Structural, morphological, and magnetic properties

Razia Nongjai, Manju Bala, Shakeel Khan, Annapoorni S., Asokan Kandasami
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Abstract

The present study focuses on the modification induced by 200 MeV Ag15+ and 100 MeV O7+ ion irradiations on the structural, surface morphological, and magnetic properties of radio frequency sputtered CoFe2O4 (CFO) thin films grown on SiO2/Si (100) substrates. X-ray diffraction shows amorphization of the CFO thin films when irradiated with Ag ions and varies with fluences. This effect is absent in the case of O ion irradiated CFO films. These results are consistent with the measurements from the Raman spectroscopy, where the intensities of Eg and T2g modes are significantly reduced and further disappear in the high fluence. The surface morphology of the O ion irradiated films is dramatically different from the pristine and Ag ion irradiated films where the surfaces appear in nanopillars-like patterns. The topography of the O ion irradiated films appears to be like hill and valley structures, the roughness first increases (from 10.11 to 24.39 nm). Then it decreases to 18.93 nm on further increasing ion fluence. The coercivity, remnant magnetization, and saturation magnetization increase upon irradiation at low fluence 5 × 1011 ions/cm2 for both the ion beams and then downturn with the increase of fluence 5 × 1012 ions/cm2. The changes in the magnetic and structural characteristics are ascribed to the defects induced by ion irradiation. These results are understood based on the structural and surface modifications induced by the electronic excitation of Ag and O ions. The study depicts that a controlled selection of ions and beam fluence can tailor the structure, morphology, and magnetic properties of ferrite films.

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CoFe2O4 薄膜中电子激发引起的改性:结构、形态和磁性能
本研究的重点是 200 MeV Ag15+ 和 100 MeV O7+ 离子辐照对生长在 SiO2/Si (100) 基质上的射频溅射 CoFe2O4 (CFO) 薄膜的结构、表面形态和磁性能的影响。X 射线衍射 (XRD) 显示,当受到银离子辐照时,CFO 薄膜会发生非晶化,且随通量的变化而变化。而 O 离子照射的 CFO 薄膜则没有这种效应。这些结果与拉曼光谱的测量结果一致,在拉曼光谱中,Eg 和 T2g 模式的强度显著降低,并在高通量下进一步消失。O 离子辐照薄膜的表面形貌与原始薄膜和 Ag 离子辐照薄膜的表面形貌截然不同,后者的表面呈纳米柱状。经 O 离子辐照的薄膜的形貌看起来像山谷结构,粗糙度首先增加(从 10.11 纳米增加到 24.39 纳米)。粗糙度首先增加(从 10.11 nm 到 24.39 nm),然后随着离子通量的进一步增加而减小到 18.93 nm。两种离子束在 5×1011 离子/厘米2 的低通量下辐照时,矫顽力、残余磁化和饱和磁化都会增加,然后随着通量 5×1012 离子/厘米2 的增加而下降。磁性和结构特性的变化归因于离子辐照诱导的缺陷。这些结果是基于 Ag 离子和 O 离子的电子激发引起的结构和表面改性而得出的。该研究表明,离子和束流的可控选择可定制铁氧体薄膜的结构、形态和磁性能。本文受版权保护。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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