Synergistic enhancement of photocatalytic efficiency and durability in CoNi-decorated Cu2O/Cu films for superior synthetic dye degradation

Setia Budi , Mega Gladiani Sutrisno , Tritiyatma Hadinugrahaningsih
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Abstract

The Cu2O/Cu emerges as a promising candidate for photocatalytic application owing to its efficient photon absorption in the visible light spectrum. However, the susceptibility of Cu2O-based photocatalysts to self-decomposition diminishes their effectiveness. This study introduces CoNi as co-catalyst to enhance the durability of Cu2O/Cu photocatalyst. Electrodeposition was employed to decorate the Cu2O/Cu crystal surface with Co, Ni and CoNi. The deposition potential of CoNi was optimized to produce a high-performance photocatalyst. The utilization of CoNi co-catalyst resulted in significant enhancements in photoelectrochemical properties under light irradiation when compared to using a single Co or Ni co-catalyst, suggesting a synergistic effect between Co and Ni within the system. The enhancement is evidenced by a noteworthy increase in the photocurrent of the photocatalyst, rising from 10.24 mA/cm2 to 20.81 mA/cm2. In addition, the decoration of CoNi resulted in a reduction of the charge transfer resistance from 4.2 kΩ to 0.7 kΩ, while simultaneously increasing the electrochemically active surface area of the photocatalyst from 15.49 cm2 to 157.69 cm2. The observed modifications lead to a substantial improvement in the photocatalytic efficiency, resulting in an impressive 88 % degradation of methylene blue, which is 3.4 times higher than achieved in the absence of the co-catalyst. Moreover, there was a significant improvement in the photostability of the photocatalyst, with an increase from 16.81 % to 50.55 %. These findings demonstrate the significance of CoNi co-catalyst decoration in producing a highly active and durable photocatalyst, making it a promising candidate for efficient synthetic dyes degradation.

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协同提高 CoNi-decorated Cu2O/Cu 薄膜的光催化效率和耐久性,实现卓越的合成染料降解效果
Cu2O/Cu 在可见光光谱中具有高效的光子吸收能力,因此成为光催化应用的理想候选材料。然而,基于 Cu2O 的光催化剂易发生自分解,从而降低了其有效性。本研究引入 CoNi 作为助催化剂,以提高 Cu2O/Cu 光催化剂的耐久性。采用电沉积法在 Cu2O/Cu 晶体表面装饰 Co、Ni 和 CoNi。对 CoNi 的沉积电位进行了优化,以生产出高性能的光催化剂。与使用单一的 Co 或 Ni 助催化剂相比,使用 CoNi 助催化剂可显著提高光照射下的光电化学特性,这表明系统中的 Co 和 Ni 具有协同效应。光催化剂的光电流显著增加,从 10.24 mA/cm2 增加到 20.81 mA/cm2,证明了这种增强作用。此外,CoNi 的装饰使电荷转移电阻从 4.2 kΩ 减小到 0.7 kΩ,同时光催化剂的电化学活性表面积从 15.49 cm2 增加到 157.69 cm2。所观察到的改性大大提高了光催化效率,使亚甲基蓝的降解率达到了令人印象深刻的 88%,比没有辅助催化剂时提高了 3.4 倍。此外,光催化剂的光稳定性也有显著提高,从 16.81% 提高到 50.55%。这些研究结果表明,CoNi 助催化剂装饰在生产高活性、高持久性光催化剂方面具有重要意义,使其成为高效降解合成染料的理想候选材料。
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