Analog-Based Synapse of Double HfZrO2 Ferroelectric FETs With Homogeneous Phase by Superlattice HfO2-ZrO2 Toward Energy Efficient Accelerator

Z.-F. Lou;A. Senapati;J.-Y. Lee;F.-S. Chang;K.-Y. Hsiang;Y.-T. Chang;C. W. Liu;S. Maikap;M. H. Lee
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Abstract

Since the analog-based energy-efficient accelerator for synapses is highly demanded in the artificial intelligence (AI) era, the homogeneous and coherence ferroelectric phase of HfZrO 2 (HZO) by superlattice (SL) growth mode with double layers is proposed in this work. The experimental results demonstrate excellent linear alternating consecutive potentiation and depression conductance (α pd = −0.85/0.63) with V RMS = 3 V. In addition, the proposed SL technique for HZOs validates the ferroelectric-based orthorhombic phase (o-phase) 75–79% by geometric phase analysis (GPA) compared to the solid-solution process for 62–64%. The double HZO (D-HZO) structure is employed for diverse coercive field (E C ) distributions to exhibit multistate data storage with 8 identical gap V T . The SL-DHZO has a sufficient ferroelectric domain, which is crucial to achieving the requirements of analog-based energy-efficient accelerators for synapses in computing in-memory generation.
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通过超晶格 HfO2-ZrO2 实现具有同质相的双 HfZrO2 铁电场效应晶体管的模拟突触,从而实现高能效加速器
人工智能(AI)时代对基于模拟的高能效突触加速器有很高的要求,因此本研究提出了采用超晶格(SL)生长模式的双层 HfZrO2(HZO)均匀相干铁电相。实验结果表明,在 VRMS = 3 V 条件下,交替连续电位和抑制电导(αp/αd = -0.85/0.63)具有极佳的线性。此外,通过几何相分析(GPA),与固溶工艺的 62-64% 相比,所提出的 HZOs 超晶格生长技术验证了 75-79% 的铁电基正交相(o 相)。双 HZO(D-HZO)结构用于不同的矫顽力场(EC)分布,以 8 个相同的间隙 VT 显示多态数据存储。SL-DHZO 具有足够的铁电畴,这对于实现基于模拟的高能效加速器的要求至关重要,可用于计算内存生成中的突触。
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