Ch. Bickmann , Ch. Meinecke , T. Korten , H. Sekulla , Ch. Helke , Th. Blaudeck , D. Reuter , St. E. Schulz
{"title":"Fabrication of switchable biocompatible, nano-fluidic devices using a thermoresponsive polymer on nano-patterned surfaces","authors":"Ch. Bickmann , Ch. Meinecke , T. Korten , H. Sekulla , Ch. Helke , Th. Blaudeck , D. Reuter , St. E. Schulz","doi":"10.1016/j.mne.2024.100265","DOIUrl":null,"url":null,"abstract":"<div><p>In this study, a method for depositing and patterning the thermosensitive polymer poly(<em>N</em>-isopropylacrylamide) on SiO<sub>2</sub> surfaces is presented for potential use in nano-sized microfluidic channels. Two approaches based on nanolithographic processes are shown for this purpose. In both cases, a self-assembling monolayer consisting of (3-aminopropyl)-dimethylethoxysilane was bound to the hydroxyl group of the substrate surface and subsequently functionalized with the polymerization initiator α-bromoisobutyryl bromide. In the first approach the silane monolayer itself was patterned using a photoresist and a lift-off process, followed by the selective deposition of the initiator, which starts a substrate-induced atom transfer radical polymerization for the growth of polymer on the silane monolayer. In the second approach, the lift-off takes place after the polymerization on the substrate surface. The result of this study shows the successful application of the process steps for the nano-dimensioned grafting of poly(<em>N</em>-isopropylacrylamide) onto SiO<sub>2</sub> substrates. The reaction time of the silane monolayer with the polymerization initiator and the composition of the reaction solution used were found to have the greatest influence of the processes. AFM and XPS analysis of the functionalized surfaces revealed patterned growth of both the self-assembling monolayer and the polymer structures.</p></div>","PeriodicalId":37111,"journal":{"name":"Micro and Nano Engineering","volume":"23 ","pages":"Article 100265"},"PeriodicalIF":2.8000,"publicationDate":"2024-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2590007224000285/pdfft?md5=65d3de0b41fb5be31e5f4007dff14894&pid=1-s2.0-S2590007224000285-main.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micro and Nano Engineering","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2590007224000285","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, a method for depositing and patterning the thermosensitive polymer poly(N-isopropylacrylamide) on SiO2 surfaces is presented for potential use in nano-sized microfluidic channels. Two approaches based on nanolithographic processes are shown for this purpose. In both cases, a self-assembling monolayer consisting of (3-aminopropyl)-dimethylethoxysilane was bound to the hydroxyl group of the substrate surface and subsequently functionalized with the polymerization initiator α-bromoisobutyryl bromide. In the first approach the silane monolayer itself was patterned using a photoresist and a lift-off process, followed by the selective deposition of the initiator, which starts a substrate-induced atom transfer radical polymerization for the growth of polymer on the silane monolayer. In the second approach, the lift-off takes place after the polymerization on the substrate surface. The result of this study shows the successful application of the process steps for the nano-dimensioned grafting of poly(N-isopropylacrylamide) onto SiO2 substrates. The reaction time of the silane monolayer with the polymerization initiator and the composition of the reaction solution used were found to have the greatest influence of the processes. AFM and XPS analysis of the functionalized surfaces revealed patterned growth of both the self-assembling monolayer and the polymer structures.