Micro and Nano Engineering最新文献

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Regional proximity effect correction for replicating 28 nm lines/spaces in HSQ as dielectric diffraction gratings with high aspect ratio

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2025-03-01 DOI: 10.1016/j.mne.2025.100295

Qingxin Wu , Wentao Yuan , Qiucheng Chen , Hao Quan , Yifang Chen

With the rapid advances of extreme ultraviolet (EUV) lithography toward ultra-high resolution, characterization technique of EUV resists by interference lithography (IL) for 14-nm node process needs urgent upgrading because of the considerable loss of light transmission by metallic grating masks. Diffraction phase gratings in dielectric silicon dioxide as masks are a promising solution, provided that 28 nm lines/spaces with high aspect ratio as well as large grating areas are obtained. This paper reports our recent success in replicating 28 nm half-pitch gratings with the aspect ratio of 13:1 and the area up to 200 × 200 μm² by state-of-the-art electron beam lithography with regional proximity effect correction (PEC) in hydrogen silsesquioxane (HSQ) coated on a 100 nm silicon nitride membrane. To ensure well resolved lines/spaces in 350 nm thick HSQ, Monte Carlo algorithm is applied in the simulations of 3D absorbing electron energy density distributions, followed by calculations of equal energy contours of deposited energy based on the kinetic development model, which enables us to work out reliable dose windows. The process developed in this work should be feasibly extended to large area gratings in a future industrialization.

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引用次数: 0

Rapid prototyping of 3D microstructures: A simplified grayscale lithography encoding method using blender

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-12-27 DOI: 10.1016/j.mne.2024.100294

Fabrício Frizera Borghi , Mohammed Bendimerad , Marie-Ly Chapon , Tatiana Petithory , Laurent Vonna , Laurent Pieuchot

The democratization of fabrication equipment has spurred recent interest in maskless grayscale lithography for both 2D and 3D microfabrication. However, the design of suitable template images remains a challenge. This work presents a simplified method for encoding 3D objects into grayscale image files optimized for grayscale lithography. Leveraging the widely used and open-source 3D modeling software Blender, we developed a robust approach to convert geometric heights into grayscale levels and generate image files through top-view rendering. Our method accurately reproduced the overall shape of simple structures like stairs and ramps compared to the original designs. We extended this approach to complex 3D sinusoidal surfaces, achieving similar results. Given the increasing accessibility and user-friendliness of digital rendering tools, this study offers a promising strategy for rapid prototyping of initial designs with minimal effort.

引用次数: 0

Pattern distortion in nanoimprint lithography using UV-curable polymer stamps

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-12-01 DOI: 10.1016/j.mne.2024.100293

Fangfang Li , Marina Fetisova , Mervi Koskinen , Jukka Viheriälä , Tapio Niemi , Petri Karvinen , Markku Kuittinen

Quantification of pattern distortion in nanoimprint lithography (NIL) is required when applying it to specific applications, especially those with tight tolerances. We present a systematic study on full wafer NIL distortion using soft stamps made of different carrier foils and UV-curable polymer structure layers. These errors are evaluated by overlay patterning using NIL and optical lithography on 4-in. wafers over a distance of 80 mm. Potential causes for pattern distortion and possible correction methods are discussed in terms of stamp composition and environmental impact. Pattern distortion along axes causing dimensional change is stamp dependent, and stiffer stamps show less pattern dimensional change than the softer ones. In the best case, the minimum variation is 4 parts per million (ppm), and in the worst case, 252 ppm with a softer stamp. Stamp flatness and uniform contact during imprinting are important in reducing high-order pattern distortion. A maximum dimensional variation of 32 ppm in a batch run demonstrates good pattern repeatability. Long-term dimensional stability can be affected by relative humidity, with variations on the order of 100 ppm.

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引用次数: 0

In situ measurements of thermal and pressure dependent stress in SOG films by phase shifting interferometry 用相移干涉法原位测量SOG薄膜中的热和压力相关应力

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-12-01 DOI: 10.1016/j.mne.2024.100292

T.M. van den Berg, A. Bosseboeuf, P. Coste, L. Vincent

Hydrogen silsesquioxane (HSQ) and Medusa are spin-on-glasses used for several applications and more specifically for electron-beam lithography. To characterize the thermal densification of these resists on silicon, the mean resist film stress was measured in situ as function of temperature up to 600 °C in a vacuum chamber by the curvature method. The curvature was evaluated from 3D profiles of uncoated and coated dies measured by full field phase shifting interferometry. Three resists were investigated: FOx-15, FOx-25 and Medusa-82. The initial resist stress at room temperature after spin coating and baking is slightly tensile and becomes highly tensile above a certain temperature dependent on the resist. This variation is mainly attributed to resists densification. FOx-15 and FOx-25 start densifying at 500 °C, and FOx-25 densifies more than FOx-15. Medusa-82 is densifying around 300 °C and has the highest tensile stress but the film relaxes beyond 405 °C. In the case of FOx-15, it was found that vacuum annealing prevents densification. Finally, we evaluated the in-plane average coefficient of thermal expansion of the resists from stress measurements during cooling to room temperature. For FOx-15, a CTE equal to 1.5 ppm/K is found, while it is close to 0.0±0.2 ppm/K for FOx-25 and 1.3 ppm/K for Medusa-82.

氢硅氧烷（HSQ）和美杜莎是用于多种应用的自旋玻璃，更具体地说是电子束光刻。为了表征这些电阻在硅上的热致密性，在真空室中使用曲率法测量了温度高达600°C时电阻膜的平均应力。利用全场移相干涉法对未涂覆模具和涂覆模具的三维轮廓进行了曲率评估。研究了3种抗虫剂：FOx-15、FOx-25和Medusa-82。经旋涂和烘烤后的抗蚀剂在室温下的初始应力是微拉伸的，在一定温度以上根据抗蚀剂的不同而变为高拉伸的。这种变化主要归因于抗蚀剂致密化。FOx-15和FOx-25在500℃时开始致密化，FOx-25的致密化程度高于FOx-15。Medusa-82在300°C左右致密化，拉伸应力最高，但在405°C以上薄膜松弛。在FOx-15的情况下，发现真空退火可以防止致密化。最后，我们评估了从冷却到室温的应力测量中电阻的面内平均热膨胀系数。对于FOx-15，发现CTE等于1.5 ppm/K，而FOx-25和Medusa-82的CTE接近0.0±0.2 ppm/K和1.3 ppm/K。

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引用次数: 0

Laser-engraved holograms as entropy source for random number generators 激光雕刻全息图作为随机数生成器的熵源

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-11-04 DOI: 10.1016/j.mne.2024.100290

Christos Tselios , Anastasios Tsakas , Simone Mazzucato , Christina Politi (Tanya) , Panagiotis Rizomiliotis , Dimitris Alexandropoulos

Our study introduces a novel approach to true random number generation (TRNG) using speckle patterns generated by laser-engraved holograms on carbon fiber-reinforced polymer (CFRP) composite substrates. Unlike previous methods, our approach simplifies the process by generating the necessary image dataset from a single microscope image of the engraved hologram. We achieve a high extraction ratio of 76 %, demonstrating the effectiveness of our TRNG. Moreover, our method successfully passes rigorous statistical tests proposed by the National Institute of Standards and Technology (NIST), indicating its suitability for cryptographic and secure system applications. This work offers promising implications for enhancing security in various domains, from secure communication networks to IoT devices.

我们的研究介绍了一种利用激光在碳纤维增强聚合物（CFRP）复合基材上雕刻全息图所产生的斑点图案进行真随机数生成（TRNG）的新方法。与以往的方法不同，我们的方法通过从雕刻全息图的单个显微镜图像生成必要的图像数据集来简化过程。我们的提取率高达 76%，证明了 TRNG 的有效性。此外，我们的方法还成功通过了美国国家标准与技术研究院（NIST）提出的严格统计测试，表明它适用于加密和安全系统应用。这项工作为增强从安全通信网络到物联网设备等各个领域的安全性提供了广阔的前景。

引用次数: 0

Release of hydrogen gas from PECVD silicon nitride thin films in cavities of MEMS sensors PECVD 氮化硅薄膜在 MEMS 传感器空腔中释放氢气

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-11-03 DOI: 10.1016/j.mne.2024.100291

P. Dani , M. Tuchen , B.E. Meli , J. Franz , J. Knoch

In this work we investigate the release of hydrogen gas from PECVD silicon nitride thin films in the cavities of MEMS based inertial sensors. Firstly, material characterization is conducted on two types of PECVD silicon nitride thin films to study the release of hydrogen gas with analytical methods. The release of hydrogen gas from these materials in encapsulated cavities of MEMS sensors, and its influence on the cavity pressure is also investigated experimentally with the help of functional microchips of MEMS based inertial sensors. Based on our findings and reports from other works, we propose steps by which change in the cavity pressure of the investigated microchip occurs over its different fabrication processes. We suggest that hydrogen gas is released form PECVD silicon nitride thin films at high temperatures during wafer bonding, which can then diffuse in cavities at low pressure over the lifetime of the sensor.

在这项工作中，我们研究了基于 MEMS 的惯性传感器空腔中 PECVD 氮化硅薄膜释放氢气的情况。首先，我们对两种类型的 PECVD 氮化硅薄膜进行了材料表征，用分析方法研究了氢气的释放。在基于 MEMS 的惯性传感器功能微芯片的帮助下，还通过实验研究了这些材料在 MEMS 传感器封装腔中的氢气释放及其对腔压的影响。根据我们的研究结果和其他研究报告，我们提出了所研究的微芯片在不同制造过程中腔体压力发生变化的步骤。我们认为，氢气是在晶片键合过程中以高温形式从 PECVD 氮化硅薄膜中释放出来的，然后在传感器的整个生命周期中以低压在腔体内扩散。

引用次数: 0

Developments in the design and microfabrication of photovoltaic retinal implants 光电视网膜植入物的设计和微加工进展

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-10-29 DOI: 10.1016/j.mne.2024.100289

Pratik Kusumanchi , Stephan Sylvest Keller , Rasmus Schmidt Davidsen

Photovoltaic retinal implants are emerging as a promising technological solution for restoring vision for patients suffering from retinal degenerative diseases such as retinitis pigmentosa and age-related macular degeneration. These prostheses contain arrays of miniaturized solar cells converting light into electrical output signals, which subsequently are employed for local activation of the intact neuroretina via microelectrodes. Leveraging cutting-edge microfabrication techniques, photovoltaic retinal implants are compact and provide a high density of solar cell pixels. This potentially increases the resolution of the artificial vision and the field of view and lowers the threshold for stimulation of retinal neurons. The introduction of flexible substrates and the integration of 3D electrodes has greatly improved the connection with retinal neurons, optimizing the spatial resolution and potentially lowering the stimulation threshold. This review explores the latest developments in photovoltaic retinal prostheses, highlighting key aspects of their design, fabrication and performance. This field of research is still in its early stage and particular emphasis is laid on promising future research directions including miniaturization of pixels, incorporation of organic flexible semiconductors and first studies considering 3D stimulating electrode structures. Despite the significant progress made, there are still substantial challenges to overcome, such as ensuring long-term biocompatibility and validation of the novel concepts in clinical trials. Ongoing interdisciplinary research and development are essential for moving these promising technologies from the lab to real-world clinical applications, ultimately enhancing vision restoration. This review aims to provide a comprehensive overview of the current state of photovoltaic retinal implants and pinpoints critical areas for future research to further advance this transformative technology.

光生伏打视网膜植入物正在成为恢复视网膜变性疾病（如视网膜色素变性和老年性黄斑变性）患者视力的一种有前途的技术解决方案。这些假体包含微型太阳能电池阵列，可将光转换为电子输出信号，然后通过微电极局部激活完整的神经视网膜。利用尖端的微加工技术，光电视网膜假体结构紧凑，太阳能电池像素密度高。这有可能提高人工视觉的分辨率和视野，并降低刺激视网膜神经元的阈值。柔性基板的引入和三维电极的集成大大改善了与视网膜神经元的连接，优化了空间分辨率，并有可能降低刺激阈值。本综述探讨了光电视网膜假体的最新发展，重点介绍了其设计、制造和性能的关键方面。这一研究领域仍处于早期阶段，特别强调了未来大有可为的研究方向，包括像素的微型化、有机柔性半导体的融入以及首次考虑三维刺激电极结构的研究。尽管取得了重大进展，但仍有大量挑战需要克服，如确保长期生物兼容性和在临床试验中验证新概念。要将这些前景广阔的技术从实验室推向现实世界的临床应用，并最终促进视力恢复，持续的跨学科研究和开发至关重要。本综述旨在全面概述光伏视网膜植入物的现状，并指出未来研究的关键领域，以进一步推动这一变革性技术的发展。

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引用次数: 0

Enhanced plasma etching using nonlinear parameter evolution 利用非线性参数演化增强等离子体蚀刻能力

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-10-18 DOI: 10.1016/j.mne.2024.100288

Arjun Moothedath, Zhong Ren

This study explores the development and characterization of plasma etching for sub-micron features using a nonlinear evolution of parameter in a three-step cyclic Bosch process. Comparing this nonlinear approach with traditional linear parameter evolution, we aimed to address issues such as bowing at the top of the features and narrowing at the bottom. Constant parameter etching produced tapered profiles, undercutting, and non-uniform scallops due to particle deflection. Linear parameter evolution partially mitigated these problems by balancing etch and deposition cycles and gradually increasing radio frequency power, achieving high selectivity to the photoresist. One nonlinear exponential evolution method resulted in a higher etch rate but caused slight damage to the top-side wall, while the etch depth was reduced. The other nonlinear method balanced the etch and deposition steps more effectively, achieving a comparable etch rate and selectivity to the linear method. Further optimization of this second method led to improved vertical profiles and controlled scallops, achieving greater depth, smoother sidewalls, and higher etch rates. This optimized technique successfully fabricated high aspect ratio periodic sub-micron structures with excellent uniformity across the wafer, demonstrating its potential for achieving even higher aspect ratios with thicker masks.

本研究探讨了在三步循环博世过程中使用非线性参数演化对亚微米特征进行等离子刻蚀的开发和特征描述。将这种非线性方法与传统的线性参数演变进行比较，我们旨在解决特征顶部弯曲和底部变窄等问题。恒定参数蚀刻会产生锥形轮廓、下切面以及由于粒子偏转而产生的不均匀扇贝。线性参数演化通过平衡蚀刻和沉积周期以及逐渐增加射频功率，部分缓解了这些问题，实现了对光刻胶的高选择性。一种非线性指数演化方法提高了蚀刻速率，但对顶侧壁造成了轻微损坏，同时蚀刻深度也有所降低。另一种非线性方法更有效地平衡了蚀刻和沉积步骤，实现了与线性方法相当的蚀刻速率和选择性。对第二种方法的进一步优化改进了垂直剖面和可控扇贝，实现了更大的蚀刻深度、更平滑的侧壁和更高的蚀刻率。这种优化技术成功地制造出了高纵横比周期性亚微米结构，并在整个晶片上实现了极佳的均匀性，证明了它具有利用更厚的掩膜实现更高纵横比的潜力。

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引用次数: 0

Low-frequency electromagnetic harvester for wind turbine vibrations 用于风力涡轮机振动的低频电磁采集器

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-09-13 DOI: 10.1016/j.mne.2024.100287

Carlos Castellano-Aldave , Aitor Plaza , Xabier Iriarte , Alfonso Carlosena

In this paper we describe and fully characterize a novel vibration harvester intended to harness energy from the vibration of a wind turbine (WT), to potentially supply power to sensing nodes oriented to structural health monitoring (SHM). The harvester is based on electromagnetic conversion (EM) and can work with vibrations of ultra-low frequencies in any direction of a plane. The harvester bases on a first prototype already disclosed by the authors, but in this paper, we develop an accurate model parameterized by a combination of physical parameters and others related to the geometry of the device. The model allows predicting not only the power generation capabilities, but also the kinematic behaviour of the harvester. Model parameters are estimated by an identification procedure and validated experimentally. Last, the harvester is tested in real conditions on a wind turbine.

在本文中，我们介绍了一种新型振动收集器，并对其进行了全面鉴定，该振动收集器旨在利用风力涡轮机（WT）的振动能量，为结构健康监测（SHM）传感节点供电。该振动收集器基于电磁转换（EM）技术，可以处理平面任何方向的超低频率振动。该收割机基于作者已公开的第一个原型，但在本文中，我们开发了一个精确的模型，该模型由物理参数和与设备几何形状相关的其他参数组合而成。该模型不仅能预测收割机的发电能力，还能预测其运动特性。模型参数通过识别程序进行估算，并通过实验进行验证。最后，在风力涡轮机上对收割机进行了实际测试。

引用次数: 0

From ghost to state-of-the-art process corrections – PEC enabled e-beam nanofabrication 从 "幽灵 "到最先进的工艺修正--PEC 电子束纳米制造技术

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering

Pub Date : 2024-09-11 DOI: 10.1016/j.mne.2024.100286

Ulrich Hofmann, Nezih Ünal, Jan Klikovits

引用次数: 0

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全部化学•材料生命科学医学物理工程技术环境•农林材料科学地球科学法学管理学化学环境科学与生态学计算机科学教育学经济学农林科学人文科学生物学数学物理与天体物理心理学综合性期刊其他工业工程理学历史学农学文学信息工程

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