Nanostructure of Cu2O/SnS Layers Thermally Evaporated: Annealing Effect on Structural and Optical Properties

IF 1.4 4区 综合性期刊 Q2 MULTIDISCIPLINARY SCIENCES Iranian Journal of Science and Technology, Transactions A: Science Pub Date : 2024-06-01 DOI:10.1007/s40995-024-01648-2
Inass Abdulah Zgair, Abdulazeez O. Mousa Al-Ogaili, Khalid Haneen Abass
{"title":"Nanostructure of Cu2O/SnS Layers Thermally Evaporated: Annealing Effect on Structural and Optical Properties","authors":"Inass Abdulah Zgair,&nbsp;Abdulazeez O. Mousa Al-Ogaili,&nbsp;Khalid Haneen Abass","doi":"10.1007/s40995-024-01648-2","DOIUrl":null,"url":null,"abstract":"<div><p>Thin film techniques and layers are essential in many industrial applications such as solar cells, gas sensors, photodetectors, etc. In this study, the impact of the annealing process on the structural and optical characteristics of tin sulfide and cuprous oxide (Cu<sub>2</sub>O NPs/SnS) thin films prepared by thermal evaporation technique onto glass substrates, then annealed at 200 °C was studied to a candidate the layers for solar cell fabrication. X-ray diffraction, surface morphology, and UV–visible measurement characterized the films. After annealing, the average crystal size of Cu<sub>2</sub>O/SnS nanostructure films decreased from 14 to 12 nm, while the dislocation and micro-strain increased. The SEM images show a uniform and homogeneous distribution after the annealing process and EDX analysis confirmed the elemental stoichiometry of the films. The obtained values of average roughness increased from 0.458 to 0.678 nm, and the root mean square increased from 0.579 to 0.875 nm. The evaluated energy gap of thin films was 1.75 eV for as-deposited and 1.8 eV for annealed films. The surface homogeneity and appropriate energy band gap refer to suitable films for optoelectronics applications.</p></div>","PeriodicalId":600,"journal":{"name":"Iranian Journal of Science and Technology, Transactions A: Science","volume":"48 4","pages":"1043 - 1051"},"PeriodicalIF":1.4000,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Iranian Journal of Science and Technology, Transactions A: Science","FirstCategoryId":"4","ListUrlMain":"https://link.springer.com/article/10.1007/s40995-024-01648-2","RegionNum":4,"RegionCategory":"综合性期刊","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MULTIDISCIPLINARY SCIENCES","Score":null,"Total":0}
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Abstract

Thin film techniques and layers are essential in many industrial applications such as solar cells, gas sensors, photodetectors, etc. In this study, the impact of the annealing process on the structural and optical characteristics of tin sulfide and cuprous oxide (Cu2O NPs/SnS) thin films prepared by thermal evaporation technique onto glass substrates, then annealed at 200 °C was studied to a candidate the layers for solar cell fabrication. X-ray diffraction, surface morphology, and UV–visible measurement characterized the films. After annealing, the average crystal size of Cu2O/SnS nanostructure films decreased from 14 to 12 nm, while the dislocation and micro-strain increased. The SEM images show a uniform and homogeneous distribution after the annealing process and EDX analysis confirmed the elemental stoichiometry of the films. The obtained values of average roughness increased from 0.458 to 0.678 nm, and the root mean square increased from 0.579 to 0.875 nm. The evaluated energy gap of thin films was 1.75 eV for as-deposited and 1.8 eV for annealed films. The surface homogeneity and appropriate energy band gap refer to suitable films for optoelectronics applications.

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热蒸发 Cu2O/SnS 层的纳米结构:退火对结构和光学特性的影响
薄膜技术和薄膜层在太阳能电池、气体传感器、光电探测器等许多工业应用中至关重要。在这项研究中,研究了退火过程对硫化锡和氧化亚铜(Cu2O NPs/SnS)薄膜结构和光学特性的影响,这些薄膜是通过热蒸发技术在玻璃基底上制备的,然后在 200 °C 下退火,以作为太阳能电池制造的候选层。薄膜的特征包括 X 射线衍射、表面形貌和紫外可见光测量。退火后,Cu2O/SnS 纳米结构薄膜的平均晶体尺寸从 14 纳米减小到 12 纳米,同时位错和微应变增加。扫描电子显微镜图像显示退火后的薄膜分布均匀一致,EDX 分析证实了薄膜的元素化学计量学。获得的平均粗糙度值从 0.458 nm 增加到 0.678 nm,均方根值从 0.579 nm 增加到 0.875 nm。薄膜的能隙评估值为:淀积薄膜 1.75 eV,退火薄膜 1.8 eV。表面均匀性和适当的能带隙表明薄膜适合光电子应用。
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来源期刊
CiteScore
4.00
自引率
5.90%
发文量
122
审稿时长
>12 weeks
期刊介绍: The aim of this journal is to foster the growth of scientific research among Iranian scientists and to provide a medium which brings the fruits of their research to the attention of the world’s scientific community. The journal publishes original research findings – which may be theoretical, experimental or both - reviews, techniques, and comments spanning all subjects in the field of basic sciences, including Physics, Chemistry, Mathematics, Statistics, Biology and Earth Sciences
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