Enhancing CdSe/ZnS Quantum-Dot Light-Emitting Diode Performance: The Impact of Thermal Treatment Atmospheres on Fabrication Processes

Abstract

We explored the thermal treatment impact on the performance of quantum-dot light-emitting diodes (QLEDs). The QLEDs comprised multiple layers: a 2.2-μm thick epoxy buffer layer; a bottom cathode composed of 12-nm MoOx/10-nm Ag/12-nm MoOx; a 20-nm ZnO electron transporting layer (ETL); a 10-nm CdSe/ZnS quantum dot light emission layer (EML); a 40-nm 4,4′,4″-Tris(carbazol-9-yl) triphenylamine hole transporting layer; a 10-nm WOx hole injection layer; and a 100-nm Ag top anode. We applied thermal treatments to the cathode, ETL, and EML separately to assess their effects on the QLEDs. Additionally, we evaluated the impact of the thermal treatment atmosphere. Vacuum thermal treatment on the cathode and EML resulted in minor improvements in QLED performance, whereas treatment of the ETL led to a decline in performance. In contrast, air thermal treatment on the cathode and EML decreased QLED performance but significantly improved it by 15% in current efficiency when applied to the ETL. The performance differences attributable to the thermal treatment atmosphere are likely due to ligand removal and oxidation processes, facilitated by thermal energy and oxygen. Our study highlights that air thermal treatment on the ETL substantially improves QLED performance, offering crucial insights into the significance of thermal treatment in QLED development.