{"title":"The Effect of the Structure of an Electric Double Layer on the Stability of Bulk Nanobubbles","authors":"S. I. Koshoridze","doi":"10.1134/s1063785024700299","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The electrostatic stabilization of bulk nanobubbles is investigated taking into account the structure of a double layer consisting of diffusion and Stern regions, with the permittivity of the latter being significantly lower than that of the former. It is shown that a narrow hydrated Stern layer significantly increases the negative electrostatic pressure and, at certain values of the surface charge, can compensate for the huge compressive Laplace pressure by preventing the diffusion dissolution of bulk nanobubbles.</p>","PeriodicalId":784,"journal":{"name":"Technical Physics Letters","volume":null,"pages":null},"PeriodicalIF":0.8000,"publicationDate":"2024-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s1063785024700299","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
The electrostatic stabilization of bulk nanobubbles is investigated taking into account the structure of a double layer consisting of diffusion and Stern regions, with the permittivity of the latter being significantly lower than that of the former. It is shown that a narrow hydrated Stern layer significantly increases the negative electrostatic pressure and, at certain values of the surface charge, can compensate for the huge compressive Laplace pressure by preventing the diffusion dissolution of bulk nanobubbles.
期刊介绍：
Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.
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