Rahmat Hadi Saputro, Tatsuro Maeda, Kaoru Toko, Ryo Matsumura* and Naoki Fukata*,
{"title":"High Doping Activation (≥1020 cm–3) in Tensile-Strained n-Ge Alloys Achieved by High-Speed Continuous-Wave Laser Annealing","authors":"Rahmat Hadi Saputro, Tatsuro Maeda, Kaoru Toko, Ryo Matsumura* and Naoki Fukata*, ","doi":"10.1021/acsaelm.4c00399","DOIUrl":null,"url":null,"abstract":"<p >Germanium-based materials are essential for the integration of Group IV optoelectronics in silicon devices. In addition to tensile strain, high n-type doping is critical, as it provides abundant carriers for recombination, potentially enabling higher photoemissions from Ge-based materials. We report here record-high 68% doping activation on n-Ge with ≥10<sup>20</sup> cm<sup>–3</sup> carrier density. This study centers on Sb-doped n-type Ge-on-insulator thin films with Si or Sn alloying grown using high-speed continuous-wave laser annealing (CWLA). Crystal mapping revealed the growth of polycrystalline n-GeSn and n-GeSi thin films with grain sizes up to 4 μm in diameter. Micro-PL measurements showed the PL intensity of n-Ge to be enhanced by the alloying of Sn and Si, with peak intensity 1.5 and 3 times higher for n-GeSn and n-GeSi, respectively. Raman peak red shift and broadening are observed in the samples, indicating high tensile strain and n-type doping. The measured carrier density of CWLA-grown films aligns well with the PL intensity trend, suggesting the process has promise for achieving electrically improved Ge-based thin films.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":null,"pages":null},"PeriodicalIF":4.3000,"publicationDate":"2024-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.4c00399","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Germanium-based materials are essential for the integration of Group IV optoelectronics in silicon devices. In addition to tensile strain, high n-type doping is critical, as it provides abundant carriers for recombination, potentially enabling higher photoemissions from Ge-based materials. We report here record-high 68% doping activation on n-Ge with ≥1020 cm–3 carrier density. This study centers on Sb-doped n-type Ge-on-insulator thin films with Si or Sn alloying grown using high-speed continuous-wave laser annealing (CWLA). Crystal mapping revealed the growth of polycrystalline n-GeSn and n-GeSi thin films with grain sizes up to 4 μm in diameter. Micro-PL measurements showed the PL intensity of n-Ge to be enhanced by the alloying of Sn and Si, with peak intensity 1.5 and 3 times higher for n-GeSn and n-GeSi, respectively. Raman peak red shift and broadening are observed in the samples, indicating high tensile strain and n-type doping. The measured carrier density of CWLA-grown films aligns well with the PL intensity trend, suggesting the process has promise for achieving electrically improved Ge-based thin films.