{"title":"Competition between silicon, beryllium and phosphorus atoms in the formation of surface chemical compounds on (101¯0) Re","authors":"E.V. Rut'kov, E.Y. Afanas'eva, N.R. Gall","doi":"10.1016/j.susc.2024.122523","DOIUrl":null,"url":null,"abstract":"<div><p>High-temperature joint adsorption has been studied of three different adsorbates, Si, Be, and P on the <span><math><mrow><mo>(</mo><mrow><mn>10</mn><mover><mn>1</mn><mo>¯</mo></mover><mn>0</mn></mrow><mo>)</mo></mrow></math></span> Re face. All three adsorbates form surface compounds with the stoichiometry ReX, where X is Si, Be, and P. In joint adsorption, one of the adsorbates is displaced into the bulk, into the dissolved state. The processes are observed at a temperature sufficient for diffusion in the bulk, 1100–1300 K. Displacement occurs in an atom-to-atom mode, and it has a “cyclic nature”: silicon displaces phosphorus, beryllium displaces silicon, and phosphorus - beryllium.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":null,"pages":null},"PeriodicalIF":2.1000,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0039602824000748","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
High-temperature joint adsorption has been studied of three different adsorbates, Si, Be, and P on the Re face. All three adsorbates form surface compounds with the stoichiometry ReX, where X is Si, Be, and P. In joint adsorption, one of the adsorbates is displaced into the bulk, into the dissolved state. The processes are observed at a temperature sufficient for diffusion in the bulk, 1100–1300 K. Displacement occurs in an atom-to-atom mode, and it has a “cyclic nature”: silicon displaces phosphorus, beryllium displaces silicon, and phosphorus - beryllium.
期刊介绍:
Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to:
• model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions
• nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena
• reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization
• phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization
• surface reactivity for environmental protection and pollution remediation
• interactions at surfaces of soft matter, including polymers and biomaterials.
Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.