Inner Doping of Carbon Nanotubes with Perovskites for Ultralow Power Transistors

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Advanced Materials Pub Date : 2024-06-11 DOI:10.1002/adma.202403743
Maguang Zhu, Huimin Yin, Jiang Cao, Lin Xu, Peng Lu, Yang Liu, Li Ding, Chenwei Fan, Haiyang Liu, Yuanfang Zhang, Yizheng Jin, Lian-Mao Peng, Chuanhong Jin, Zhiyong Zhang
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Abstract

Semiconducting carbon nanotubes (CNTs) are considered as the most promising channel material to construct ultrascaled field-effect transistors, but the perfect sp2 C─C structure makes stable doping difficult, which limits the electrical designability of CNT devices. Here, an inner doping method is developed by filling CNTs with 1D halide perovskites to form a coaxial heterojunction, which enables a stable n-type field-effect transistor for constructing complementary metal–oxide–semiconductor electronics. Most importantly, a quasi-broken-gap (BG) heterojunction tunnel field-effect transistor (TFET) is first demonstrated based on an individual partial-filling CsPbBr3/CNT and exhibits a subthreshold swing of 35 mV dec−1 with a high on-state current of up to 4.9 µA per tube and an on/off current ratio of up to 105 at room temperature. The quasi-BG TFET based on the CsPbBr3/CNT coaxial heterojunction paves the way for constructing high-performance and ultralow power consumption integrated circuits.

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在碳纳米管内部掺入过氧化物以实现超低功率晶体管。
半导体碳纳米管(CNT)一直被认为是最有希望构建超大规模场效应晶体管(FET)的通道材料,但完美的sp2 C-C 结构使得稳定掺杂变得困难,从而限制了 CNT 器件的电气可设计性。在此,我们开发了一种内部掺杂方法,通过在 CNT 中填充一维(1D)卤化物过氧化物来形成同轴异质结,从而实现稳定的 n 型场效应晶体管(CNT-FET),用于构建互补金属氧化物半导体(CMOS)电子器件。最重要的是,基于单个部分填充 CsPbBr3/CNT 的准断裂间隙(BG)异质结隧道场效应晶体管(TFET)首次得到了验证,并在室温下表现出 35 mV dec-1 的亚阈值摆幅、高达 4.9 μA/tube 的导通电流和高达 105 的导通/关断电流比。基于 CsPbBr3/CNT 同轴异质结的准 BG TFET 为构建高性能和超低功耗集成电路铺平了道路。本文受版权保护。保留所有权利。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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