Effect of sputtering power and substrate bias on microstructure, mechanical properties and corrosion behavior of CoCrFeMnNi high entropy alloy thin films deposited by magnetron sputtering method

Abstract

The CoCrFeMnNi high entropy alloy thin films with crystalline (solid solution) structure or amorphous state were fabricated by magnetron sputtering process at different target powers and different substrate bias. Effects of the target power and substrate bias on the characteristics of the CoCrFeMnNi thin films such as microstructures, morphology and surface topography, as well as mechanical properties and corrosion behavior were studied. Phase prediction was calculated by using thermodynamic and kinetic criteria under various deposition conditions. The enthalpy, entropy, $\delta$ and Ω parameters, and electronegativity differences influenced the solid solution stability of thin films. These parameters led to the formation of solid solutions with crystalline or amorphous structures under specific limits, which corresponded to the practical XRD and TEM analysis results. Using a substrate bias in the deposition of CoCrFeMnNi thin film changed the amorphous structure to a crystalline (solid solution (BCC + FCC)) at higher target powers (200 and 300 W). On the other hand, the film structure was entirely amorphous at all sputtering target powers without the substrate bias. The mechanical properties, such as hardness, Young's modulus, film strength, and fracture toughness of CoCrFeMnNi thin film, can be enhanced by using the substrate bias and increasing the sputtering power. The potentiodynamic polarization test in 3.5 wt% NaCl aqueous solution indicated that the deposition of CoCrFeMnNi thin films at different sputtering powers and without substrate bias could increase the corrosion resistance of 304 stainless steel substrate. Using the substrate bias of −100 V in the fabrication of CoCrFeMnNi thin film decreased the corrosion current density and increased its polarization resistance.