{"title":"Preparation of TaON thin films by nitridation of solution process-derived precursor films with urea","authors":"Amon Higuchi, Nataly Carolina Rosero-Navarro, Akira Miura, Yuji Masubuchi, Kiyoharu Tadanaga","doi":"10.1007/s10971-024-06457-y","DOIUrl":null,"url":null,"abstract":"<p>Tantalum Oxynitride (TaON) has been recognized as a visible-light photocatalyst, and is thus expected to be applicable to semiconductive and transparent conductive film. In this study, TaON thin films were prepared on a silica glass substrate by nitridation of Ta<sub>2</sub>O<sub>5</sub> precursor films using urea. The precursor Ta<sub>2</sub>O<sub>5</sub> films were prepared from Ta(OC<sub>2</sub>H<sub>5</sub>)<sub>5</sub>. Then, urea and the precursor Ta<sub>2</sub>O<sub>5</sub> thin film were placed at the upstream and downstream sides in a tube furnace, respectively, and heated under a nitrogen flow to supply the vaporized urea constituent to the surface of the Ta<sub>2</sub>O<sub>5</sub> precursor film. Thin film of β-TaON was obtained by a heat treatment at 1000 °C with urea under nitrogen flow. The transmittance of the film was 70 ~ 80% in the wavelength region from 500 to 800 nm, and the optical bandgap of the film was 2.65 eV.</p><h3 data-test=\"abstract-sub-heading\">Graphical Abstract</h3>","PeriodicalId":664,"journal":{"name":"Journal of Sol-Gel Science and Technology","volume":null,"pages":null},"PeriodicalIF":2.3000,"publicationDate":"2024-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Sol-Gel Science and Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1007/s10971-024-06457-y","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
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Abstract
Tantalum Oxynitride (TaON) has been recognized as a visible-light photocatalyst, and is thus expected to be applicable to semiconductive and transparent conductive film. In this study, TaON thin films were prepared on a silica glass substrate by nitridation of Ta2O5 precursor films using urea. The precursor Ta2O5 films were prepared from Ta(OC2H5)5. Then, urea and the precursor Ta2O5 thin film were placed at the upstream and downstream sides in a tube furnace, respectively, and heated under a nitrogen flow to supply the vaporized urea constituent to the surface of the Ta2O5 precursor film. Thin film of β-TaON was obtained by a heat treatment at 1000 °C with urea under nitrogen flow. The transmittance of the film was 70 ~ 80% in the wavelength region from 500 to 800 nm, and the optical bandgap of the film was 2.65 eV.
期刊介绍：
The primary objective of the Journal of Sol-Gel Science and Technology (JSST), the official journal of the International Sol-Gel Society, is to provide an international forum for the dissemination of scientific, technological, and general knowledge about materials processed by chemical nanotechnologies known as the "sol-gel" process. The materials of interest include gels, gel-derived glasses, ceramics in form of nano- and micro-powders, bulk, fibres, thin films and coatings as well as more recent materials such as hybrid organic-inorganic materials and composites. Such materials exhibit a wide range of optical, electronic, magnetic, chemical, environmental, and biomedical properties and functionalities. Methods for producing sol-gel-derived materials and the industrial uses of these materials are also of great interest.
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