Photo-patternable ZnO thin films based on fast crosslinking of zinc acrylate and acrylic acid for optical and electrical applications

IF 2.3 4区 材料科学 Q2 MATERIALS SCIENCE, CERAMICS Journal of Sol-Gel Science and Technology Pub Date : 2024-06-25 DOI:10.1007/s10971-024-06462-1
Mingxiang Zhou, Shakespear Takudzwa Samu, Min Deng, Bo Wei, Yunqing Lu, Jin Wang
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Abstract

The UV polymerization method is an efficient method to fabricate zinc oxide (ZnO) thin films. So far, this method is mainly based on the self-polymerization of zinc-based monomers, followed by annealing. However, the self-polymerization usually leads to long polymerization times, irregular morphologies of the product, and reaction wastes. To address these issues, the novel fabrication process and recipe to form ZnO films are proposed. This proposal uses zinc-based monomers and their solvent (acrylic acid) collectively as reactants in the polymerization process. The cross-linking between them significantly reduces the polymerization time to a few seconds without the reaction waste, and leads to a well-defined surface morphology of the zinc-based precursor film. The structures, morphologies and optoelectric properties of the ZnO films annealed at different temperatures are characterized. The results show that the ZnO nanocrystals exhibit a hexagonal wurtzite crystal structure. The ZnO films exhibit an average transmittance as high as 98% in the visible spectrum, and the optical bandgaps of 3.24–3.29 eV. The electrical performance of the film is strongly correlated with the oxygen vacancies content, leading to the highest carrier concentration and the lowest electrical resistivity of 4.09 × 10−1 Ωcm at the annealing temperature of 450 °C.

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基于丙烯酸锌和丙烯酸快速交联的光图案氧化锌薄膜,用于光学和电气应用
摘要 紫外聚合法是制造氧化锌(ZnO)薄膜的一种有效方法。迄今为止,这种方法主要基于锌基单体的自聚合,然后进行退火。然而,自聚合通常会导致聚合时间过长、产物形态不规则以及反应废物。为了解决这些问题,我们提出了新的制造工艺和配方来形成氧化锌薄膜。该建议将锌基单体及其溶剂(丙烯酸)共同用作聚合过程中的反应物。它们之间的交联大大缩短了聚合时间,使其缩短到几秒钟,而且不会产生反应废料,还能使锌基前驱体薄膜的表面形态更加清晰。研究人员对不同温度下退火的氧化锌薄膜的结构、形态和光电特性进行了表征。结果表明,氧化锌纳米晶体呈现出六方菱面体晶体结构。氧化锌薄膜在可见光谱中的平均透射率高达 98%,光带隙为 3.24-3.29 eV。薄膜的电气性能与氧空位含量密切相关,在退火温度为 450 ℃ 时,载流子浓度最高,电阻率最低,为 4.09 × 10-1 Ωcm。
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来源期刊
Journal of Sol-Gel Science and Technology
Journal of Sol-Gel Science and Technology 工程技术-材料科学:硅酸盐
CiteScore
4.70
自引率
4.00%
发文量
280
审稿时长
2.1 months
期刊介绍: The primary objective of the Journal of Sol-Gel Science and Technology (JSST), the official journal of the International Sol-Gel Society, is to provide an international forum for the dissemination of scientific, technological, and general knowledge about materials processed by chemical nanotechnologies known as the "sol-gel" process. The materials of interest include gels, gel-derived glasses, ceramics in form of nano- and micro-powders, bulk, fibres, thin films and coatings as well as more recent materials such as hybrid organic-inorganic materials and composites. Such materials exhibit a wide range of optical, electronic, magnetic, chemical, environmental, and biomedical properties and functionalities. Methods for producing sol-gel-derived materials and the industrial uses of these materials are also of great interest.
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