Performance improvement of 1.3 μm InAlGaAs MQW modulators grown by MOVPE using C-doped InAl(Ga)As cladding layers

Abstract

We propose a novel epitaxial layer structure to prevent Zn from diffusing into a multiple quantum well (MQW) layer of an electro-absorption modulator (EAM). Zn is practically employed as a p-type dopant in an InP material system, but there is a technical issue of unintentional Zn diffusion. In this work, we introduce a novel C-doped p-type layer between a Zn-doped p-cladding layer of InP and MQW to both reduce Zn diffusion and accurately define a p-i-n junction interface. The Zn concentrations in the MQW for each device are compared by measuring secondary ion mass spectrometry (SIMS). To clarify how the reduction of diffused Zn affects the EAM characteristics, we fabricate the EAMs with each epitaxial structure and compare their extinction ratio characteristics. The evaluation of extinction ratio per EAM capacitance successfully demonstrates that employing the C-doped layer effectively improves the EAM characteristics.