Metallization of polyetherimide with 3D structures by supercritical carbon dioxide-assisted electroless NiP plating

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Micro and Nano Engineering Pub Date : 2024-07-02 DOI:10.1016/j.mne.2024.100271
Ami Iwasaki , Tomoyuki Kurioka , Po-Wei Cheng , Chun-Yi Chen , Tso-Fu Mark Chang , Kei Takase , Hiroshi Ishihata , Masato Sone
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Abstract

Polyetherimide (PEI) with 3-dimensional (3D) structures is a promising material for applications in electronic devices because of its numerous attractive properties. In the applications of PEI, the low electrical conductivity is often a shortcoming. The electrical conductivity can be improved by a metallization process. Electroless plating is a common metallization process for polymeric materials; however, conventional electroless plating process scarcely provides the metallized PEI. In this work, we overcome this limitation by a supercritical carbon dioxide (scCO2)-assisted electroless NiP plating process. This scCO2-assisted electroless NiP plating allows metallization of PEI with 3D structures and realizes a low electrical resistance suitable for practical use in the electronic devices.

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通过超临界二氧化碳辅助无电解NiP电镀实现具有三维结构的聚醚酰亚胺的金属化
具有三维(3D)结构的聚醚酰亚胺(PEI)因其众多吸引人的特性,在电子设备中是一种很有应用前景的材料。在 PEI 的应用中,低导电性往往是一个缺点。可以通过金属化工艺来提高导电性。无电解电镀是高分子材料常用的金属化工艺,但传统的无电解电镀工艺几乎无法提供金属化的 PEI。在这项工作中,我们采用超临界二氧化碳(scCO2)辅助无电解镀镍工艺克服了这一限制。这种由 scCO2 辅助的无电解镀镍工艺可实现具有三维结构的 PEI 金属化,并具有适合电子设备实际使用的低电阻。
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来源期刊
Micro and Nano Engineering
Micro and Nano Engineering Engineering-Electrical and Electronic Engineering
CiteScore
3.30
自引率
0.00%
发文量
67
审稿时长
80 days
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