{"title":"Is the Future of Moore's Law in a Particle Accelerator?: Wiggling Electrons Could Turbocharge EUV Lithography","authors":"John Boyd","doi":"10.1109/MSPEC.2024.10589684","DOIUrl":null,"url":null,"abstract":"As Intel, Samsung, TSMC, and Japan's upcoming advanced foundry Rapidus each make their separate preparations to cram more and more transistors into every square millimeter of silicon, one thing they all have in common is that the extreme ultraviolet (EUV) lithography technology underpinning their efforts is extremely complex, extremely expensive, and extremely costly to operate. A prime reason is that the source of this system's 13.5-nanometer light is the precise and costly process of blasting flying droplets of molten tin with the most powerful commercial lasers on the planet.","PeriodicalId":13249,"journal":{"name":"IEEE Spectrum","volume":null,"pages":null},"PeriodicalIF":2.6000,"publicationDate":"2024-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Spectrum","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10589684/","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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Abstract
As Intel, Samsung, TSMC, and Japan's upcoming advanced foundry Rapidus each make their separate preparations to cram more and more transistors into every square millimeter of silicon, one thing they all have in common is that the extreme ultraviolet (EUV) lithography technology underpinning their efforts is extremely complex, extremely expensive, and extremely costly to operate. A prime reason is that the source of this system's 13.5-nanometer light is the precise and costly process of blasting flying droplets of molten tin with the most powerful commercial lasers on the planet.
期刊介绍：
IEEE Spectrum Magazine, the flagship publication of the IEEE, explores the development, applications and implications of new technologies. It anticipates trends in engineering, science, and technology, and provides a forum for understanding, discussion and leadership in these areas.
IEEE Spectrum is the world''s leading engineering and scientific magazine. Read by over 300,000 engineers worldwide, Spectrum provides international coverage of all technical issues and advances in computers, communications, and electronics. Written in clear, concise language for the non-specialist, Spectrum''s high editorial standards and worldwide resources ensure technical accuracy and state-of-the-art relevance.
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