Pradyumna Kumar Chand , Radha Raman , Zhi-Long Yen , Ian Daniell Santos , Wei-Ssu Liao , Ya-Ping Hsieh , Mario Hofmann
{"title":"Gas phase alloyed crystalline S–Se dielectrics with high ionic mobility","authors":"Pradyumna Kumar Chand , Radha Raman , Zhi-Long Yen , Ian Daniell Santos , Wei-Ssu Liao , Ya-Ping Hsieh , Mario Hofmann","doi":"10.1016/j.jsamd.2024.100763","DOIUrl":null,"url":null,"abstract":"<div><p>The advancement of future electronic devices necessitates dielectric materials with enhanced compositional complexity and improved capabilities. We here demonstrate a gas-phase alloying approach that yields ultrathin and crystalline dielectrics with attractive properties for the integration into electronics. A surface-selective deposition process was shown to produce sulfur (S) and selenium (Se) alloys with large-scale uniformity. Through combination of experimental diffraction analysis and materials modeling, we establish the crystallinity of the alloy with a modified lattice structure compared to the host materials. The resulting lattice arrangement endows the alloy dielectric with high ionic mobility as validated by electrochemical impedance spectroscopy. Leveraging this innovative feature, we fabricate memristive devices exhibiting promising performance characteristics. Our findings demonstrate the feasibility of utilizing gas-phase alloying to engineer dielectrics with superior properties and functionality for future device integration.</p></div>","PeriodicalId":17219,"journal":{"name":"Journal of Science: Advanced Materials and Devices","volume":"9 3","pages":"Article 100763"},"PeriodicalIF":6.7000,"publicationDate":"2024-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2468217924000947/pdfft?md5=2e2390255e9e259672a7b80db97bfb4f&pid=1-s2.0-S2468217924000947-main.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Science: Advanced Materials and Devices","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2468217924000947","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The advancement of future electronic devices necessitates dielectric materials with enhanced compositional complexity and improved capabilities. We here demonstrate a gas-phase alloying approach that yields ultrathin and crystalline dielectrics with attractive properties for the integration into electronics. A surface-selective deposition process was shown to produce sulfur (S) and selenium (Se) alloys with large-scale uniformity. Through combination of experimental diffraction analysis and materials modeling, we establish the crystallinity of the alloy with a modified lattice structure compared to the host materials. The resulting lattice arrangement endows the alloy dielectric with high ionic mobility as validated by electrochemical impedance spectroscopy. Leveraging this innovative feature, we fabricate memristive devices exhibiting promising performance characteristics. Our findings demonstrate the feasibility of utilizing gas-phase alloying to engineer dielectrics with superior properties and functionality for future device integration.
未来电子设备的发展需要成分更复杂、性能更强的电介质材料。我们在此展示了一种气相合金化方法,它能产生超薄、结晶的电介质,并具有极具吸引力的特性,可集成到电子设备中。研究表明,表面选择性沉积工艺可生产出具有大规模均匀性的硫 (S) 和硒 (Se) 合金。通过结合实验衍射分析和材料建模,我们确定了合金的结晶度,与主材料相比,合金的晶格结构有所改变。由此产生的晶格排列使合金电介质具有高离子迁移率,这一点已通过电化学阻抗光谱得到验证。利用这一创新特性,我们制造出了具有良好性能特点的忆阻器件。我们的研究结果证明了利用气相合金化技术制造具有优异性能和功能的电介质以实现未来器件集成的可行性。
期刊介绍:
In 1985, the Journal of Science was founded as a platform for publishing national and international research papers across various disciplines, including natural sciences, technology, social sciences, and humanities. Over the years, the journal has experienced remarkable growth in terms of quality, size, and scope. Today, it encompasses a diverse range of publications dedicated to academic research.
Considering the rapid expansion of materials science, we are pleased to introduce the Journal of Science: Advanced Materials and Devices. This new addition to our journal series offers researchers an exciting opportunity to publish their work on all aspects of materials science and technology within the esteemed Journal of Science.
With this development, we aim to revolutionize the way research in materials science is expressed and organized, further strengthening our commitment to promoting outstanding research across various scientific and technological fields.