Shih-Hsiang (Shane) Lin, Marko Simicic, Nicolas Pantano
{"title":"Towards efficient ESD protection strategies for advanced 3D systems-on-chip","authors":"Shih-Hsiang (Shane) Lin, Marko Simicic, Nicolas Pantano","doi":"10.1038/s44287-024-00071-4","DOIUrl":null,"url":null,"abstract":"2.5D/3D technologies require designers to reduce electrostatic discharge (ESD) protection of the internal I/O interfaces. To avoid over-design of ESD protection, designers require a more fundamental understanding of the ESD events that occur at this level. Here we present insights, practical guidelines and research directions for circuit designers and suppliers of bonding tools.","PeriodicalId":501701,"journal":{"name":"Nature Reviews Electrical Engineering","volume":"1 7","pages":"429-431"},"PeriodicalIF":0.0000,"publicationDate":"2024-07-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Reviews Electrical Engineering","FirstCategoryId":"1085","ListUrlMain":"https://www.nature.com/articles/s44287-024-00071-4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
2.5D/3D technologies require designers to reduce electrostatic discharge (ESD) protection of the internal I/O interfaces. To avoid over-design of ESD protection, designers require a more fundamental understanding of the ESD events that occur at this level. Here we present insights, practical guidelines and research directions for circuit designers and suppliers of bonding tools.