Effect of wavelength in light irradiation for Fe2+/Fe3+ redox cycle of Fe3O4/g-C3N4 in photocatalysis and photo-Fenton systems

IF 4.1 3区化学 Q2 CHEMISTRY, PHYSICAL Journal of Photochemistry and Photobiology A-chemistry Pub Date : 2024-07-15 DOI:10.1016/j.jphotochem.2024.115876

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Abstract

The Fe²⁺/Fe³⁺ redox cycle is the rate-determining step of hydroxyl radical formation in the photo-Fenton system. In this research, methyl orange (MO) was used which was degraded using Fe₃O₄/g-C₃N₄ in photocatalysis and photo-Fenton systems. The influence of wavelength irradiation on the redox cycle of Fe²⁺/Fe³⁺ ions was investigated. The results showed that the MO degradation rate constant reached 0.152 min⁻¹ in photo-Fenton and 0.090 min⁻¹ in photocatalysis using UV–vis light, which is 50 and 30 times higher than Fenton system. Light irradiation affects iron-leaching process and iron photoreduction. The iron leaching occurs more frequently at high energies and does not occur at λ ≥ 420 nm. In photo-Fenton, interaction between H₂O₂ and Fe₃O₄ surface makes the leaching process easier to occur. The photoreduction results show that the effective conversion of Fe³⁺ to Fe²⁺ occurs at λ ≥ 380 nm with the percentage of Fe²⁺ reaching ∼90 % in both systems.

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光照波长对光催化和光-芬顿系统中 Fe3O4/g-C3N4 的 Fe2+/Fe3+ 氧化还原循环的影响

Fe2+/Fe3+ 氧化还原循环是光-芬顿系统中羟基自由基形成的决定性步骤。本研究使用 Fe3O4/g-C3N4 在光催化和光 Fenton 系统中降解甲基橙（MO）。研究了波长照射对 Fe2+/Fe3+ 离子氧化还原循环的影响。结果表明，使用紫外可见光进行光催化时，MO 的降解速率常数达到 0.152 min-1；使用紫外可见光进行光催化时，MO 的降解速率常数达到 0.090 min-1，分别是 Fenton 系统的 50 倍和 30 倍。光照会影响铁的浸出过程和铁的光氧化还原。在高能量下，铁沥滤发生得更频繁，而在λ ≥ 420 纳米时则不会发生。在光-芬顿中，H2O2 与 Fe3O4 表面之间的相互作用使浸出过程更容易发生。光还原结果表明，Fe3+ 到 Fe2+ 的有效转化发生在 λ≥ 380 纳米时，两种体系中 Fe2+ 的比例都达到了 90%。

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来源期刊

Journal of Photochemistry and Photobiology A-chemistry 化学-物理化学

CiteScore

7.90

自引率

7.00%

发文量

580

审稿时长

48 days

期刊介绍： JPPA publishes the results of fundamental studies on all aspects of chemical phenomena induced by interactions between light and molecules/matter of all kinds. All systems capable of being described at the molecular or integrated multimolecular level are appropriate for the journal. This includes all molecular chemical species as well as biomolecular, supramolecular, polymer and other macromolecular systems, as well as solid state photochemistry. In addition, the journal publishes studies of semiconductor and other photoactive organic and inorganic materials, photocatalysis (organic, inorganic, supramolecular and superconductor). The scope includes condensed and gas phase photochemistry, as well as synchrotron radiation chemistry. A broad range of processes and techniques in photochemistry are covered such as light induced energy, electron and proton transfer; nonlinear photochemical behavior; mechanistic investigation of photochemical reactions and identification of the products of photochemical reactions; quantum yield determinations and measurements of rate constants for primary and secondary photochemical processes; steady-state and time-resolved emission, ultrafast spectroscopic methods, single molecule spectroscopy, time resolved X-ray diffraction, luminescence microscopy, and scattering spectroscopy applied to photochemistry. Papers in emerging and applied areas such as luminescent sensors, electroluminescence, solar energy conversion, atmospheric photochemistry, environmental remediation, and related photocatalytic chemistry are also welcome.