Ryotaro Hayasaka, T. Kanda, Y. Masutake, Duy Khanh Nguyen, N. Hasegawa, Seitaro Inoue, Asato Wada, M. Kitamura, D. Shiga, K. Yoshimatsu, H. Kumigashira
{"title":"Common anion rule in oxide heterointerfaces: Experimental verification by in situ photoemission spectroscopy","authors":"Ryotaro Hayasaka, T. Kanda, Y. Masutake, Duy Khanh Nguyen, N. Hasegawa, Seitaro Inoue, Asato Wada, M. Kitamura, D. Shiga, K. Yoshimatsu, H. Kumigashira","doi":"10.1063/5.0223269","DOIUrl":null,"url":null,"abstract":"The band alignment at the interface is one of the fundamental parameters for designing electronic devices and artificial functional materials. However, there is no firmly established guideline for oxide heterostructures, limiting the functional design of oxide heterostructures. Here, we provide spectral evidence that the band diagram of oxide heterointerfaces is well described by the Zhong and Hansmann scheme based on the common anion rule [Z. Zhong and P. Hansmann, Phys. Rev. X 7, 011023 (2017)]. By utilizing the elemental selectivity of Ti 2p–3d resonant photoemission for the Ti 3d state near the Fermi level, we directly visualize the presence or absence of charge transfer from the overlayer films to SrTiO3 in prototypical heterointerfaces of SrVO3/SrTiO3 and SrNbO3/SrTiO3. It is found that the charge transfer occurs in SrNbO3/SrTiO3 but not in SrVO3/SrTiO3, as predicted by the Zhong and Hansmann scheme, indicating that the presence or absence, as well as the sign and amount, of interfacial charge transfer is predicted by this scheme. Our findings provide guidelines for designing and controlling the functionalities in oxide nanostructures.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"88 1","pages":""},"PeriodicalIF":8.2000,"publicationDate":"2024-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1063/5.0223269","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The band alignment at the interface is one of the fundamental parameters for designing electronic devices and artificial functional materials. However, there is no firmly established guideline for oxide heterostructures, limiting the functional design of oxide heterostructures. Here, we provide spectral evidence that the band diagram of oxide heterointerfaces is well described by the Zhong and Hansmann scheme based on the common anion rule [Z. Zhong and P. Hansmann, Phys. Rev. X 7, 011023 (2017)]. By utilizing the elemental selectivity of Ti 2p–3d resonant photoemission for the Ti 3d state near the Fermi level, we directly visualize the presence or absence of charge transfer from the overlayer films to SrTiO3 in prototypical heterointerfaces of SrVO3/SrTiO3 and SrNbO3/SrTiO3. It is found that the charge transfer occurs in SrNbO3/SrTiO3 but not in SrVO3/SrTiO3, as predicted by the Zhong and Hansmann scheme, indicating that the presence or absence, as well as the sign and amount, of interfacial charge transfer is predicted by this scheme. Our findings provide guidelines for designing and controlling the functionalities in oxide nanostructures.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.