Electrical Strength of Polymer Film with Randomly Distributed Air Inclusions

Yu. P. Virchenko, Amanuel Mehari Tewolde
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Abstract

A probabilistic model has been constructed to describe the physical state of a dielectric film that contains randomly distributed air inclusions with random radius \(\tilde {r}\). Analysis of this model has shown that the statistical distribution of electrical strength, which is less than that of a defect-free film, has exactly two maxima. It is realized at a sufficiently low density of air inclusions of random radius \(\tilde {r}\), which has an almost uniform probability distribution within the limits \({{r}_{*}}\) > \(\tilde {r}\) > 0. Moreover, the position of the first maximum is determined by the value of the parameter \({{r}_{*}}\). With increasing defect density or film thickness, the first maximum disappears and the electrical strength distribution becomes unimodal.

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带有随机分布空气夹杂物的聚合物薄膜的电强度
摘要 建立了一个概率模型来描述电介质薄膜的物理状态,该薄膜含有随机分布的空气夹杂物,其半径为随机的(\tilde {r}\)。对该模型的分析表明,电强度的统计分布(小于无缺陷薄膜的电强度)恰好有两个最大值。它是在随机半径 \(\tilde {r}\) 的空气夹杂物密度足够低的情况下实现的,在 \({{r}_{*}}\) > \(\tilde {r}\) > 0 的范围内具有几乎均匀的概率分布。随着缺陷密度或薄膜厚度的增加,第一个最大值消失,电强度分布变成单峰。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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