Study of Hydrogen Migration in Titanium Using a Vortex Electromagnetic Field and Accelerated Electrons in Subthreshold Values

Yu. I. Tyurin, V. V. Larionov
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Abstract

The migration of hydrogen in a homogeneously hydrogen-saturated commercial titanium VT1-0 has been studied using a high-frequency electromagnetic field and an accelerated electron beam. The use of a high-frequency 50–1000 kHz electromagnetic field, which generates eddy currents in the material, made it possible to observe the process of hydrogen migration near the surface and in the depth of the sample. To accelerate the migration of hydrogen in the volume of the sample electron irradiation with an energy of 30–45 keV was used. The migration process was studied in an inhomogeneously hydrogen-saturated commercial titanium sample with a titanium nitride film deposited on its surface by magnetron sputtering. VT1-0 flat samples were saturated with hydrogen using the Sieverts method. The diffusion coefficient of hydrogen in titanium was determined from the change in the magnitude of the signal from the eddy current sensor along the depth of the sample and along the sample, as hydrogen migrated in the sample. The values of the diffusion coefficients of hydrogen along the surface and in the depth of the sample under equilibrium conditions and under stimulation by an accelerated electron beam were obtained.

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利用涡旋电磁场和阈下加速电子研究钛中的氢迁移
摘要 利用高频电磁场和加速电子束研究了氢在均匀氢饱和商用钛 VT1-0 中的迁移。50-1000 kHz 的高频电磁场会在材料中产生涡流,因此可以观察到氢在样品表面和深处的迁移过程。为了加速氢在样品体积内的迁移,使用了能量为 30-45 千伏的电子辐照。研究了不均匀氢饱和商用钛样品的迁移过程,样品表面通过磁控溅射沉积了一层氮化钛薄膜。VT1-0 平面样品采用西弗茨法使氢饱和。氢在钛中的扩散系数是根据氢在样品中迁移时,涡流传感器信号沿样品深度和沿样品的大小变化确定的。得出了在平衡条件下和在加速电子束的刺激下,氢在样品表面和深度的扩散系数值。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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