Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates

IF 3.7 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Advanced Photonics Research Pub Date : 2024-07-22 DOI:10.1002/adpr.202400057
S. S. Thöny, Manuel Bärtschi, Marietta Batzer, Manuel Baselgia, Raphael Gmünder, Amit Sharma, Tijmen Vermeij, Xavier Maeder, Stephan Waldner
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Abstract

Quantization effects in nanolaminate structures of oxide materials are proposed and experimentally demonstrated only recently. Herein, the material combination of amorphous silicon and SiO2 deposited by magnetron sputtering is investigated and it is shown that the quantization effect can be observed indeed. Transmission electron microscopy characterization gives evidence of continuous layers of amorphous silicon and SiO2 with well‐defined interfaces. The deposition process is described and the tunability of the refractive index and the bandgap energy is demonstrated. By doing so, the advantages of this novel material over classical optical materials are shown and feasibility is proved. As an example, a longpass optical interference filter with edge at 720 nm is deposited using quantized nanolaminates as the high and SiO2 as the low refractive index material. This filter can be deposited successfully with close match to the design. It shows a blocking range throughout the visible spectrum whereas a comparable filter based on SiO2–TiO2 only blocks 500–700 nm.
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磁控溅射沉积非晶硅-二氧化硅定量纳米层压板
氧化物材料纳米层状结构中的量子化效应直到最近才被提出并在实验中得到证实。本文研究了通过磁控溅射沉积的非晶硅和二氧化硅的材料组合,结果表明确实可以观察到量子化效应。透射电子显微镜表征表明,非晶硅和二氧化硅层是连续的,且界面清晰。对沉积过程进行了描述,并展示了折射率和带隙能的可调性。通过这种方法,展示了这种新型材料相对于传统光学材料的优势,并证明了其可行性。例如,以量子化纳米层板为高折射率材料,二氧化硅为低折射率材料,沉积了一个边缘波长为 720 纳米的长通光学干涉滤波器。该滤光片的沉积非常成功,与设计非常吻合。它的阻挡范围覆盖整个可见光谱,而基于二氧化硅-二氧化钛的同类滤光片只能阻挡 500-700 纳米的波长。
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