Experimental and simulation study of argon helicon discharge in the linear plasma device MPS-LD

Jintao Wu, C. Sang, Changjiang Sun, Bin Sun, Shuaishuai Gao, Y. Bian, Yao Peng, Qi Wang, Dezhen Wang
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Abstract

To obtain high-parameter plasma in target region of the linear plasma device MPS-LD and to realize the experimental simulation environment of tokamak divertor plasma, experimental and numerical simulations of argon helicon discharge are carried out. Langmuir probes are used to diagnose the electron density (ne) in source and target regions with different experimental parameters (magnetic field, RF power, puffing flow rate). A three-dimensional discharge model is developed by using drift-diffusion equations of electron density and electron energy with the aid of COMSOL. The helicon discharge with long straight plasma beam and bright blue core is experimentally achieved. The simulation and experiment results are compared, showing the validation of the model. The corresponding spatial ne distribution is obtained, and the dependences of ne on the main experimental parameters are confirmed. The energy conversion relationship between the helicon and plasma is found. Helicon wave prefers to transfer energy to the plasma in source region, where ne is significantly raised. It results in a strong ne gradient, which acts a barrier to prevent the propagation of helicon wave. Therefore, localized standing helicon wave is formed and it limits the increase of plasma density in target region. Increasing magnetic field strength (B < 1500G) and RF power (P < 1500W), ne in source region can be increased, but they have little effect on ne in target region.
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线性等离子体装置 MPS-LD 中氩氦放电的实验和模拟研究
为了获得线性等离子体装置MPS-LD靶区的高参数等离子体,并实现托卡马克岔流器等离子体的实验模拟环境,对氩氦放电进行了实验和数值模拟。在不同的实验参数(磁场、射频功率、膨化流速)下,使用朗缪尔探针诊断源区和靶区的电子密度(ne)。借助 COMSOL,利用电子密度和电子能量的漂移扩散方程建立了三维放电模型。实验实现了具有长直等离子体束和明亮蓝色内核的螺旋子放电。比较了模拟和实验结果,证明了模型的有效性。得到了相应的空间氖分布,并证实了氖与主要实验参数的相关性。找到了螺旋波与等离子体之间的能量转换关系。螺旋波更倾向于将能量转移到等离子体的源区,而等离子体的氖值在源区明显升高。这导致了强烈的氖梯度,成为阻止螺旋子波传播的障碍。因此,形成了局部驻留的螺旋子波,限制了目标区域等离子体密度的增加。增加磁场强度(B < 1500G)和射频功率(P < 1500W)可以增加源区的氖,但对靶区的氖影响不大。
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