Ferroelectric Al0.85Sc0.15N and Hf0.5Zr0.5O2 Domain Switching Dynamics.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-08-14 Epub Date: 2024-07-31 DOI:10.1021/acsami.4c05798
Roberto Guido, Xuetao Wang, Bohan Xu, Ruben Alcala, Thomas Mikolajick, Uwe Schroeder, Patrick D Lomenzo
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Abstract

The capability to reliably program partial polarization states with nanosecond programming speed and femtojoule energies per bit in ferroelectrics makes them an ideal candidate to realize multibit memory elements for high-density crossbar arrays, which could enable neural network models with a large number of parameters at the edge. However, a thorough understanding of the domain switching dynamics involved in the polarization reversal is required to achieve full control of the multibit capability. Transient current integration measurements are adopted to investigate the domain dynamics in aluminum scandium nitride (Al0.85Sc0.15N) and hafnium zirconium oxide (Hf0.5Zr0.5O2). The switching dynamics are correlated to the crystal structure of the films. The contributions of domain nucleation and domain wall motion are decoupled by analyzing the rate of change of the time-dependent normalized switched polarization. Thermally activated creep domain wall motion characterizes the Al0.85Sc0.15N switching dynamics. The statistics of independently nucleating domains and the domain wall creep motion in Hf0.5Zr0.5O2 are associated with the spatially inhomogeneous distribution of local switching field due to polymorphism, absence of preferential crystallite orientation, as well as defects and charges that can be located at the grain boundaries. The c-axis texture, single-phase nature, and strong likelihood of less fabrication process-induced defects contribute to the homogeneity of the local switching field in Al0.85Sc0.15N. Nonetheless, defects generated and redistributed upon bipolar electric field switching cycling result in Al0.85Sc0.15N domain wall pinning. The wake-up effect in Hf0.5Zr0.5O2 is explained thorough the continuous addition of switchable regions associated with two independent distributions of characteristic switching times.

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铁电 Al0.85Sc0.15N 和 Hf0.5Zr0.5O2 域切换动力学。
铁电能以纳秒级的编程速度和飞焦耳级的每比特能量对部分极化态进行可靠编程,这使它们成为实现高密度交叉条阵列多比特存储元件的理想候选材料,从而可以在边缘建立具有大量参数的神经网络模型。然而,要实现对多比特能力的全面控制,需要对极化反转所涉及的畴切换动力学有透彻的了解。瞬态电流积分测量用于研究氮化铝钪(Al0.85Sc0.15N)和氧化铪锆(Hf0.5Zr0.5O2)的畴动态。开关动力学与薄膜的晶体结构相关。通过分析随时间变化的归一化开关极化的变化率,将畴成核和畴壁运动的贡献分离开来。热激活蠕变畴壁运动是 Al0.85Sc0.15N 开关动力学的特征。Hf0.5Zr0.5O2中独立成核畴和畴壁蠕变运动的统计与局部开关场的空间不均匀分布有关,这是由于多晶体、无优先晶粒取向以及可能位于晶界的缺陷和电荷造成的。在 Al0.85Sc0.15N 中,c 轴纹理、单相性质以及制造过程诱发缺陷的可能性较小,这些因素都有助于局部开关场的均匀性。然而,双极电场切换循环时产生和重新分布的缺陷会导致 Al0.85Sc0.15N 的畴壁针化。Hf0.5Zr0.5O2中的唤醒效应可以通过不断增加与两个独立的特征开关时间分布相关的可开关区域来解释。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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