Electrical transport characteristics of atomic contact and nanogap dynamically formed by electromigration

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2024-07-31 DOI:10.1063/5.0225503

Tianran Zhao, Jieyi Zhang, Hefa Feng, Shoujun Peng, Dong Xiang

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Abstract

The feature size of circuits was gradually reduced to a few nanometers, which is prone to lead to the failure of the metal circuit even upon a low bias voltage due to the electromigration. Therefore, it is essential to understand the electrical transport characteristics of a narrow metal wire shrunk to atomic scale due to electromigration. To this end, we report that the approach for metal deposition and the underneath substrate play a critical role in determining the electron transport behavior. It is observed that the conductance of the narrow metal wire fabricated on a SiO2 substrate first rises and then decreases during the electromigration process when the cross section of the metal wire is reduced to a few atoms. However, such a phenomenon is not observed for the metal wire fabricated on a polyimide substrate. Assisted by component analysis technology, it is revealed that the metal atoms can penetrate into the underneath substrate during the metal deposition process, and the metal atoms buried in the different substrates result in distinguished conductance behavior.

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电迁移动态形成的原子接触和纳米间隙的电传输特性

电路的特征尺寸逐渐缩小到几纳米，即使在低偏置电压下也容易因电迁移而导致金属电路失效。因此，了解因电迁移而缩小到原子尺度的窄金属丝的电传输特性至关重要。为此，我们报告了金属沉积的方法和底层基底在决定电子传输行为中的关键作用。据观察，在二氧化硅基底上制造的窄金属线在电迁移过程中，当金属线的横截面缩小到几个原子时，其电导率会先上升后下降。然而，在聚酰亚胺基底上制作的金属丝却没有出现这种现象。在分量分析技术的帮助下，我们发现金属原子在金属沉积过程中可以渗透到基底下面，而埋藏在不同基底中的金属原子会产生不同的导电行为。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.