Implementation and Analysis of Unipolar High-Voltage Pulse Modulator for 172-nm VUV Excilamp

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-07-31 DOI:10.1109/TPS.2024.3433015
Brijendra Kumar Verma;Subhash Kumar Ram;Vivek Kumar Saini;Udit Narayan Pal;Ram Prakash Lamba
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Abstract

Dielectric barrier discharge (DBD)-based excimer sources have found diverse applications in biomedical, agriculture, pharmacy, surface treatment, and industrial processes. The radiation ability of DBD-based 172-nm excimer radiation source to break molecular bonds in organic matter is beneficial for processes, such as ultracleaning and surface activation, improving adhesion. The high-voltage pulsed power modulator plays a critical role in generating efficient plasma discharge for a 172-nm VUV excimer lamp. The precise control of output pulsed amplitude voltage and pulse repetition frequency (PRF) is required for generating efficient and uniform plasma inside the plasma tube. In this article a two switch forward converter (S2FC) topology with snubber at the output is proposed to generate unipolar pulse output for 172-nm VUV excimer source. The developed prototype of high-voltage unipolar impulse power modulator (HVU-IPM) has a 32-kHz PRF and a 1- $\mu $ s pulsewidth with adjustable output pulse voltage. The mathematical model for calculating the DBD pulse voltage and current is developed through mode analysis of the proposed HVU-IPM system. The experimental verifications of the developed prototype of HVU-IPM system are carried out to evaluate the system performance. The DBD plasma generated by the developed HVU-IPM remains stable across a broader range of operating parameters, such as gas pressure and applied voltages, and generates VUV light of absolute irradiance up to 11.24 mW/cm2. The achieved rise time/fall time of output pulse is below 400 ns.
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用于 172 纳米紫外激光灯的单极高压脉冲调制器的实现与分析
基于介质阻挡放电(DBD)的准分子辐射源在生物医学、农业、制药、表面处理和工业过程中有着广泛的应用。基于 DBD 的 172-nm 准分子辐射源具有打破有机物分子键的辐射能力,有利于超净和表面活化等过程,从而提高附着力。高压脉冲功率调制器在为 172 纳米紫外准分子灯产生高效等离子体放电方面起着至关重要的作用。输出脉冲振幅电压和脉冲重复频率(PRF)的精确控制是在等离子管内产生高效、均匀等离子体的必要条件。本文提出了一种在输出端带有缓冲器的双开关正向转换器(S2FC)拓扑结构,用于为 172 纳米紫外准分子源产生单极脉冲输出。所开发的高压单极脉冲功率调制器(HVU-IPM)原型具有 32 kHz 的 PRF 和 1- $\mu $ s 的脉宽,输出脉冲电压可调。通过对拟议的 HVU-IPM 系统进行模式分析,建立了计算 DBD 脉冲电压和电流的数学模型。对开发的 HVU-IPM 系统原型进行了实验验证,以评估系统性能。所开发的 HVU-IPM 生成的 DBD 等离子体在气体压力和外加电压等较宽的工作参数范围内保持稳定,并能产生绝对辐照度高达 11.24 mW/cm2 的紫外光。输出脉冲的上升/下降时间低于 400 ns。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
期刊最新文献
IEEE Transactions on Plasma Science information for authors Blank Page IEEE Transactions on Plasma Science Special Issue on Discharges and Electrical Insulation in Vacuum Special Issue on the 40th PSSI National Symposium on Plasma Science and Technology (PLASMA 2025) Special Issue on Selected Papers from APSPT-14 May 2027
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