High-Performance p-GaN/AlGaN/GaN HEMT-Based Ultraviolet Phototransistors With fW-Level Weak Light Detection Capacity

IF 4.5 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Electron Device Letters Pub Date : 2024-08-06 DOI:10.1109/LED.2024.3439518
Haiping Wang;Haifan You;Yifu Wang;Yiwang Wang;Hui Guo;Jiandong Ye;Hai Lu;Rong Zhang;Youdou Zheng;Dunjun Chen
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Abstract

In this work, high-performance ultraviolet (UV) phototransistors (PTs) based on the p-GaN/ AlGaN/GaN HEMT structure were reported. An innovative strategy making a tradeoff between the absorption thickness of the incident light and the retraction distance of the depletion region was developed for the first time. The optimal PTs exhibited a large photo-to-dark-current ratio (PDCR) of $1.30\times 10^{{11}}$ , a high responsivity of $5.50\times 10^{{5}}$ A/W, and a record-high UV-to-visible rejection ratio (UVRR) over $1\times 10^{{9}}$ while maintaining a fast response time of $136.0~\mu $ s. Moreover, the devices present excellent weak light detection capability with a threshold light intensity as low as 7.90 nW/cm 2 , enabling direct detection of the 119.05 fW signal. Additionally, the measurement of the noise characteristics revealed that the low-frequency noise of the device originating from the trap dominated 1/f flicker noise, and a superior detectivity ( ${D}^{\ast }\text {)}$ above $1\times 10^{{18}}$ cm $\cdot $ Hz $^{\text {1/ {2}}}$ /W was achieved. The results suggest the enormous potential of p-GaN-based UV PTs for high-sensitivity visible-blind UV detection.
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具有 fW 级弱光探测能力的高性能 p-GaN/AlGaN/GaN HEMT 紫外线光电晶体管
这项研究报告了基于 p-GaN/ AlGaN/GaN HEMT 结构的高性能紫外线(UV)光电晶体管(PT)。该研究首次开发了一种在入射光吸收厚度和耗尽区回缩距离之间进行权衡的创新策略。最优 PTs 的光暗电流比 (PDCR) 高达 1.30/times 10^{{11}}$,响应率高达 5.50/times 10^{{5}}$ A/W,紫外-可见光抑制比 (UVRR) 超过 1/times 10^{{9}}$,同时保持了 136 美元的快速响应时间。此外,该器件还具有出色的弱光检测能力,阈值光强低至 7.90 nW/cm2,可直接检测 119.05 fW 的信号。此外,噪声特性的测量结果表明,器件的低频噪声主要来自阱的1/f闪烁噪声,并实现了高于1/times 10^{{18}}$ cm $\cdot $ Hz $^{text {1/ {2}}$ /W的超强探测能力(${D}^{ast}\text {)}$。这些结果表明,基于 p-GaN 的紫外 PTs 在高灵敏度可见光盲紫外检测方面具有巨大的潜力。
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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