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Announcing an IEEE/Optica Publishing Group Journal of Lightwave Technology Special Issue on: OFS-29
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540244
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引用次数: 0
IEEE Transactions on Electron Devices Table of Contents
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540238
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引用次数: 0
IEEE Electron Device Letters Information for Authors
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540236
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引用次数: 0
Wide Band Gap Semiconductors for Automotive Applications
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540240
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引用次数: 0
Corrections to “A Tunneling Light-Emitting Device With Ultra-Narrow Linewidth Emission at Room-Temperature”
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3537721
Yuanpeng Wu;Yixin Xiao;Kai Sun;Jianyang Xiao;Bowen Tian;Ding Wang;Danhao Wang;Kelotchi S Figueroa;Alexander McFarland;Parag B. Deotare;Zetian Mi
In the above article [1], there is a correction to author information and funding information. The correct information is found in the byline and the first footnote.
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引用次数: 0
IEEE Electron Device Letters Publication Information
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540230
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引用次数: 0
Exploration of the exciting world of multifunctional oxide-based electronic devices: from material to system-level applications
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540242
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引用次数: 0
EDS Meetings Calendar
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540234
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引用次数: 0
Call for Nominations for Editor-in-Chief IEEE Transactions on Semiconductor Manufacturing
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-26 DOI: 10.1109/LED.2025.3540226
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引用次数: 0
Investigation of Inhibited String Characteristics According to Dimple Structures in 3D NAND Flash Memory
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-02-03 DOI: 10.1109/LED.2025.3531354
Jesun Park;Myounggon Kang
In this letter, we investigated the boosted channel potential (V $_{mathbf {textit {ch}}}$ ) in inhibited strings with dimple (concave and convex) structures and analyzed the program (PGM) disturbance caused by $V_{mathbf {{ch}}}$ . In concave structures, the electric field (e-field) concentrated in the spacer (SP) region, resulting in a decrease in V $_{mathbf {textit {ch}}}$ as the degree of concavity increases. In convex structures, the e-field concentrates in the center of the word line (WL) region, boosting $V_{mathbf {{ch}}}$ as the degree of convexity increases. This occurs due to the dispersion or concentration of the PGM voltage applied to the WL. High V $_{mathbf {textit {ch}}}$ in the selected WL increases the potential difference ( $Delta $ V $_{mathbf {textit {ch}}}$ ) between adjacent WLs. Due to structural characteristics, the lateral e-field (E $_{mathbf {m}}$ ) is largest in concave structures, whereas the vertical e-field (E $_{mathbf {textit {ox}}}$ ) dominates in convex structures. Consequently, PGM disturb characteristics caused by hot carrier injection (HCI) are significantly degraded in convex structures.
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引用次数: 0
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IEEE Electron Device Letters
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