{"title":"Sustainable Semiconductor Manufacturing: The Role of Lithography","authors":"Emily Gallagher;Lars-Åke Ragnarsson;Cedric Rolin","doi":"10.1109/TSM.2024.3416830","DOIUrl":null,"url":null,"abstract":"Sustainability and semiconductor manufacturing are linked in ways that may not be visible to experts in either area; this opacity is slowly fading with the surge of corporate commitments toward net-zero carbon emissions by 2050. In 2023, imec released a model (imec.netzero) to quantify the environmental impact of manufacturing integrated circuits (ICs). In this paper, the emissions trends are used to create an understanding of the processes that contribute. Lithography - both 193nm (DUV) and 13.5 nm (EUV) - has a large role to play in changing the overall emissions of IC chip manufacturing. Methods for reducing the emissions associated with lithography include design and process choices that maximize throughput and tool operational choices to reduce consumption. Low-emissions behaviors in manufacturing can be promoted once their potential benefit has been quantified. Engineers are well-accustomed to optimizing for performance; we must now optimize for lower emissions in parallel.","PeriodicalId":451,"journal":{"name":"IEEE Transactions on Semiconductor Manufacturing","volume":"37 4","pages":"440-444"},"PeriodicalIF":2.3000,"publicationDate":"2024-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Semiconductor Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10564116/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Sustainability and semiconductor manufacturing are linked in ways that may not be visible to experts in either area; this opacity is slowly fading with the surge of corporate commitments toward net-zero carbon emissions by 2050. In 2023, imec released a model (imec.netzero) to quantify the environmental impact of manufacturing integrated circuits (ICs). In this paper, the emissions trends are used to create an understanding of the processes that contribute. Lithography - both 193nm (DUV) and 13.5 nm (EUV) - has a large role to play in changing the overall emissions of IC chip manufacturing. Methods for reducing the emissions associated with lithography include design and process choices that maximize throughput and tool operational choices to reduce consumption. Low-emissions behaviors in manufacturing can be promoted once their potential benefit has been quantified. Engineers are well-accustomed to optimizing for performance; we must now optimize for lower emissions in parallel.
期刊介绍:
The IEEE Transactions on Semiconductor Manufacturing addresses the challenging problems of manufacturing complex microelectronic components, especially very large scale integrated circuits (VLSI). Manufacturing these products requires precision micropatterning, precise control of materials properties, ultraclean work environments, and complex interactions of chemical, physical, electrical and mechanical processes.