Electrochemical reduction of Al(III) and Si(IV) in the NaF-AlF3-Al2O3-SiO2 molten salt system and preparation of homogeneous Al-Si alloys by molten salt electrolysis

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2024-08-07 DOI:10.1016/j.matchemphys.2024.129801
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Abstract

The segregation of aluminum-silicon alloys directly impacts the mechanical and chemical properties of the alloys, Therefore, homogenization of alloys is of great significance for alloys. This study initially investigated the electrochemical behavior of aluminum (III) and silicon (IV) during the preparation of aluminum-silicon (Al-Si) alloys in NaF-AlF3-Al2O3-SiO2 molten salts through cyclic voltammetry and steady-state polarization. The results revealed that Al2O3 underwent one-step reduction to Al, whereas SiO2 underwent a two-step reduction process to Si. In addition, electrolysis experiments were carried out in a NaF-AlF3-Al2O3-SiO2-5wt%CaF2-1wt%MgF2-2wt%LiF molten salt system with molecular ratio of 2.4. These experiments involved variations in current density, electrolysis time, Al2O3 and SiO2 additions. It is worth noting that under the conditions of current density of 0.7 A/cm2, electrolysis time of 2 h, and silica addition of 2 %, the reduction rate of silicon reached a maximum value of 72.57 %, at which time the silicon in the aluminum-silicon alloys showed a dendritic structure, which was uniformly distributed throughout the entire alloy, and the segregation of the alloy was effectively avoided.

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NaF-AlF3-Al2O3-SiO2 熔盐体系中铝(III)和硅(IV)的电化学还原以及通过熔盐电解制备均质铝硅合金
铝硅合金的偏析直接影响合金的机械和化学特性,因此合金的均匀化对合金具有重要意义。本研究通过循环伏安法和稳态极化法初步研究了在 NaF-AlF3-Al2O3-SiO2 熔盐中制备铝硅(Al-Si)合金过程中铝(III)和硅(IV)的电化学行为。结果表明,Al2O3 经过一步还原为 Al,而 SiO2 则经过两步还原为 Si。此外,还在分子比为 2.4 的 NaF-AlF3-Al2O3-SiO2-5wt%CaF2-1wt%MgF2-2wt%LiF 熔盐体系中进行了电解实验。这些实验涉及电流密度、电解时间、Al2O3 和 SiO2 添加量的变化。值得注意的是,在电流密度为 0.7 A/cm2、电解时间为 2 h、二氧化硅添加量为 2 % 的条件下,硅的还原率达到最大值 72.57 %,此时铝硅合金中的硅呈现树枝状结构,均匀分布在整个合金中,有效避免了合金偏析。
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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