The effect of the acceleration voltage on the quality of structure determination by 3D-electron diffraction

IF 2.1 3区 工程技术 Q2 MICROSCOPY Ultramicroscopy Pub Date : 2024-08-05 DOI:10.1016/j.ultramic.2024.114022
Saleh Gholam, Joke Hadermann
{"title":"The effect of the acceleration voltage on the quality of structure determination by 3D-electron diffraction","authors":"Saleh Gholam,&nbsp;Joke Hadermann","doi":"10.1016/j.ultramic.2024.114022","DOIUrl":null,"url":null,"abstract":"<div><p>Nowadays, 3D Electron Diffraction (3DED) is widely used for the structure determination of sub-micron-sized particles. In this work, we investigate the influence of the acceleration voltage on the quality of 3DED datasets acquired on BaTiO<sub>3</sub> nanoparticles. Datasets were acquired using a wide range of beam energies, from common, high acceleration voltages (300 kV and 200 kV) to medium (120 kV and 80 kV) and low acceleration voltages (60 kV and 30 kV). It was observed that, in the integration process, R<sub>int</sub> increases as the beam energy is reduced, which is mainly due to the increased dynamical scattering. Nevertheless, the structure was solved successfully in all cases. The structure refinement was comparable for all beam energies with small deficiencies such as negative atomic displacements for the heaviest atom in the structure, barium. Including extinction correction in the refinement noticeably improved the model for low acceleration voltages, probably due to higher beam absorption in these cases. Dynamical refinement, however, shows superior results for higher acceleration voltages, since the dynamical refinement calculations currently ignore inelastic scattering effects.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114022"},"PeriodicalIF":2.1000,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ultramicroscopy","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0304399124001013","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MICROSCOPY","Score":null,"Total":0}
引用次数: 0

Abstract

Nowadays, 3D Electron Diffraction (3DED) is widely used for the structure determination of sub-micron-sized particles. In this work, we investigate the influence of the acceleration voltage on the quality of 3DED datasets acquired on BaTiO3 nanoparticles. Datasets were acquired using a wide range of beam energies, from common, high acceleration voltages (300 kV and 200 kV) to medium (120 kV and 80 kV) and low acceleration voltages (60 kV and 30 kV). It was observed that, in the integration process, Rint increases as the beam energy is reduced, which is mainly due to the increased dynamical scattering. Nevertheless, the structure was solved successfully in all cases. The structure refinement was comparable for all beam energies with small deficiencies such as negative atomic displacements for the heaviest atom in the structure, barium. Including extinction correction in the refinement noticeably improved the model for low acceleration voltages, probably due to higher beam absorption in these cases. Dynamical refinement, however, shows superior results for higher acceleration voltages, since the dynamical refinement calculations currently ignore inelastic scattering effects.

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
加速电压对三维电子衍射结构测定质量的影响
如今,三维电子衍射(3DED)被广泛用于亚微米级颗粒的结构测定。在这项工作中,我们研究了加速电压对 BaTiO3 纳米粒子三维电子衍射数据集质量的影响。数据集是在广泛的光束能量范围内获得的,从常见的高加速电压(300 kV 和 200 kV)到中等加速电压(120 kV 和 80 kV)和低加速电压(60 kV 和 30 kV)。据观察,在积分过程中,Rint 会随着光束能量的降低而增加,这主要是由于动态散射的增加。尽管如此,在所有情况下都成功地解决了结构问题。所有光束能量下的结构细化结果都相当,只是存在一些小的缺陷,例如结构中最重的原子钡的原子位移为负值。在细化过程中加入消光校正明显改善了低加速电压下的模型,这可能是由于在这些情况下光束吸收较多。然而,由于动态细化计算目前忽略了非弹性散射效应,因此动态细化在较高加速电压下显示出更优越的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
期刊最新文献
Editorial Board Chinese knot inspired isotropic linear scanning method for improved imaging performance in AFM Toward quantitative thermoelectric characterization of (nano)materials by in-situ transmission electron microscopy New experimental methodology for determining the second crossover energy in insulators under stationary e-irradiation in a SEM Beyond the random phase approximation (RPA): First principles calculation of the valence EELS spectrum for KBr including local field, quasiparticle, excitonic and spin orbit coupling effects
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1