Dual-responsive smart nano-platform targeting peptide modifications synergistically enhances multimodal therapy for liver cancer

IF 4.3 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2024-08-15 DOI:10.1016/j.matchemphys.2024.129863

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Abstract

The success of clinical therapies against liver cancer is largely determined the accuracy rate of treatment. Herein, we designed a dual-responsive smart nano-platform (HMCuS@DOX@9R–P201) could realize multimodal synergistic therapy. The nano-platform could precisely recognize the protein marker FOXM1c-DBD on the surface of HepG2 cells. The apoptosis rate of HepG2 cells reached 98.51 % under near-infrared (NIR) laser irradiation, and the tumor inhibition rate of HMCD9P NPs + L treatment group was as high as 88.2 % in mice. Moreover, it could up-regulate the apoptosis-related protein Bak, down-regulate PARP-1, Bcl-2, and Caspase 8, and inhibit the pathway protein FOXM1, thus down-regulating Skp2, up-regulate p27Kip1, and precise induction of multimodal synergistic therapy based on chemotherapy, photothermal therapy (PTT), and photodynamic therapy (PDT) to improve anti-HCC efficacy and reduce side effects. Overall, we report a liver cancer-targeted smart nano-platform with promising anti-liver cancer effects and multiple synergistic therapeutic mechanisms.

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靶向肽修饰的双响应智能纳米平台可协同增强肝癌的多模式疗法

肝癌临床疗法的成功与否在很大程度上取决于治疗的准确率。在此，我们设计了一种可实现多模式协同治疗的双响应智能纳米平台（HMCuS@DOX@9R-P201）。该纳米平台可精确识别 HepG2 细胞表面的蛋白标记 FOXM1c-DBD。在近红外激光照射下，HepG2 细胞的凋亡率达到 98.51%，HMCD9P NPs + L 治疗组对小鼠肿瘤的抑制率高达 88.2%。此外，它还能上调凋亡相关蛋白Bak，下调PARP-1、Bcl-2和Caspase 8，抑制通路蛋白FOXM1，从而下调Skp2，上调p27Kip1，精准诱导基于化疗、光热疗法（PTT）和光动力疗法（PDT）的多模式协同治疗，提高抗肝癌疗效，减少副作用。总之，我们报告了一种具有良好抗肝癌效果和多种协同治疗机制的肝癌靶向智能纳米平台。

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来源期刊

Materials Chemistry and Physics 工程技术-材料科学：综合

CiteScore

8.70

自引率

4.30%

发文量

1515

审稿时长

69 days

期刊介绍： Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.