Electronic properties of InSe/CNT heterojunctions with the modulation of electric field and vacancy defects

IF 3.1 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Computational Materials Science Pub Date : 2024-09-04 DOI:10.1016/j.commatsci.2024.113339
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Abstract

We investigate van der Waals (vdW) heterojunctions by combining InSe and zigzag carbon nanotubes (CNT(n,0)) by first-principle calculations. When n ranges from 5 to 7, The heterojunctions show n-type Schottky contact. However, for n of 8, 9, and 11, the heterojunctions still retain the characteristic of semiconductors with bandgaps. The metallized InSe/CNT(10,0) heterojunction has the most amount of charge transfer and the highest tunneling probability. Ohmic contact can be formed in InSe/CNT(n,0) (n = 5–7) heterojunctions under the external electric field. The charge transfer is enhanced and Schottky barrier heights are significantly reduced in heterojunctions with Se vacancy defect. In vacancy defect causes the disappearance of Schottky barrier because of metallization of InSe and more charge transfer than Se vacancy defect in InSe/CNT. Our findings provide a direction for the application of InSe/CNT in tunable nanoelectronic devices.

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电场和空位缺陷调制下 InSe/CNT 异质结的电子特性
我们通过第一原理计算研究了铟硒和人字形碳纳米管(CNT(n,0))结合的范德华(vdW)异质结。当 n 为 5 至 7 时,异质结显示出 n 型肖特基接触。然而,当 n 为 8、9 和 11 时,异质结仍然保留了带隙半导体的特性。金属化 InSe/CNT(10,0)异质结的电荷转移量最大,隧穿概率最高。在外部电场的作用下,InSe/CNT(n,0) (n = 5-7) 异质结可以形成欧姆接触。在具有 Se 空位缺陷的异质结中,电荷转移增强,肖特基势垒高度显著降低。在 InSe/CNT 中,由于 InSe 的金属化和比 Se 空位缺陷更多的电荷转移,In 空位缺陷导致肖特基势垒消失。我们的研究结果为 InSe/CNT 在可调纳米电子器件中的应用提供了一个方向。
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来源期刊
Computational Materials Science
Computational Materials Science 工程技术-材料科学:综合
CiteScore
6.50
自引率
6.10%
发文量
665
审稿时长
26 days
期刊介绍: The goal of Computational Materials Science is to report on results that provide new or unique insights into, or significantly expand our understanding of, the properties of materials or phenomena associated with their design, synthesis, processing, characterization, and utilization. To be relevant to the journal, the results should be applied or applicable to specific material systems that are discussed within the submission.
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