Optimisation of pulsed laser deposited Ba1-xKxBiO3 thin films with tunable superconducting properties by control of K doping level, x

IF 6.2 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Superconductivity Pub Date : 2024-09-01 DOI:10.1016/j.supcon.2024.100115
A. Kursumovic , J. Prestigiacomo , M. de h-Óra , W. Li , J. Feighan , V. Smolyaninova , I. Smolyaninov , M. Osofsky , J.L. MacManus-Driscoll
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Abstract

The mid-TC superconductor Ba1-XKXBiO3 (BKBO) exhibits different superconducting mechanisms depending on x, in the range ∼ 0.35–0.65. The optimal doping for the highest TC is reported to be around x  = 0.4. To understand more about the dependence of the superconducting mechanism on x, high quality and reproducible epitaxial films with controlled x are needed. This has been challenging owing to the volatility of K and (to a lesser extent) Bi. In this work, we use pulsed laser deposition (PLD) with several novel process steps to achieve high-quality films in a reproducible way. These include a modified method for target preparation, a low NO2 growth pressure, and precise positioning of substrates in the PLD plume. Optimum TC films (32 K onset) were grown from an x  = 0.4 target, i.e. with no excess K, as is normally used. Stable, higher K content films (made from an x = 0.45 target), were also grown. These x = 0.45 films had a lower TC (22.5 K onset), as expected for (K) overdoped films, with very high upper critical field, HC2 (0 K), and irreversibility field, Hirr (0 K), values, from linear extrapolation, of ∼ 31.7 T and ∼ 28.8 T, respectively. The growth methodology demonstrated in this work is highly beneficial for fundamental mechanistic studies of this complex superconductor on which there is renewed interest, and where controlled compositions and crystalline quality are currently limited.

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通过控制 K 掺杂水平 x 优化具有可调超导特性的脉冲激光沉积 Ba1-xKxBiO3 薄膜
中TC超导体Ba1-XKXBiO3(BKBO)表现出不同的超导机制,取决于x,范围在0.35~0.65之间。据报道,实现最高超导电性的最佳掺杂量约为 x = 0.4。要进一步了解超导机制对 x 的依赖性,就需要控制 x 的高质量、可重现的外延薄膜。由于 K 和 Bi(在较小程度上)的不稳定性,这一直是个挑战。在这项工作中,我们利用脉冲激光沉积 (PLD) 技术和几个新颖的工艺步骤,以可重复的方式获得了高质量的薄膜。这些步骤包括改进的目标制备方法、低二氧化氮生长压力以及基底在 PLD 烟流中的精确定位。最佳 TC 薄膜(32 K 起始值)是由 x = 0.4 靶件生长出来的,也就是说,与通常使用的方法一样,没有过量的 K。此外,还生长出了稳定的、钾含量较高的薄膜(由 x = 0.45 靶件制成)。这些 x = 0.45 的薄膜具有较低的 TC 值(22.5 K 起始值),正如(K)过量掺杂的薄膜所预期的那样,具有非常高的上临界场 HC2(0 K)和不可逆场 Hirr(0 K),根据线性外推法,其值分别为 ∼ 31.7 T 和 ∼ 28.8 T。这项工作中展示的生长方法对这种复杂超导体的基础机理研究大有裨益,目前人们对这种超导体的兴趣又重新燃起,而这种超导体的可控成分和结晶质量却受到限制。
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