Single-coated thick superconducting films for metal–organic deposition using trifluoroacetates

IF 1.8 3区 工程技术 Q3 PHYSICS, APPLIED Cryogenics Pub Date : 2024-09-03 DOI:10.1016/j.cryogenics.2024.103939
Takeshi Araki , Mariko Hayashi , Nao Kobayashi
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引用次数: 0

Abstract

Metal-organic deposition using trifluoroacetates (TFA-MOD) is known to yield uniform superconducting wires by a liquid growth mode. However, it has been difficult to prepare thick films because of drying stress during the calcining process. To avoid the drying stress, conventional crack-preventing chemicals such as H(CH2)8COOH are applied in conventional metal–organic deposition. However, large amounts of hydrogen atoms react with fluorine atoms during calcining process in TFA-MOD, and the consequent increased harmful carbon residue decreases superconductivity of the resulting films. To avoid the chemical reaction, new crack-preventing chemicals such as H(CF2)8COOH were applied to prepare single-coated thick films. A low ratio of hydrogen atoms decreases the chemical reaction and generates hydrogen fluorine gas, consequently suppressing the carbon residue. Above the calcining temperature, the crack-preventing chemical is decomposed into low-boiling-point chemicals such as CF2CF2 or CF3CF3. Consequently, single-coated thick film having low carbon residue and sufficient superconducting current per width was realized. For a long time, the authors have studied other possible candidate crack-preventing chemicals. Newly introduced fluorine ion measurement of decomposed materials during the calcining process revealed the nature of the crack-preventing chemicals. Based on the accumulated results, we have concluded that among over one million chemicals there are only two groups suitable for preparing single-coated thick superconducting films by TFA-MOD. One group is hydrogenated perfluoro-carboxylic acids such as H(CF2)8COOH and the other group is perfluoro di-carboxylic acids. With H(CF2)8COOH, using a single-coating process we were able to achieve a 560 nm-thick YBa2Cu3O6.93 film having Jc of 4.70 MA/cm2 (77 K,0T). Compared with a standard 150 nm-thick YBa2Cu3O6.93 film having Jc of 7.70 MA/cm2 (77 K,0T), the critical current per width is improved to about 227 %.

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使用三氟乙酸盐进行金属有机沉积的单涂层厚超导薄膜
众所周知,使用三氟乙酸盐的金属有机沉积(TFA-MOD)可通过液态生长模式产生均匀的超导线。然而,由于煅烧过程中会产生干燥应力,因此很难制备厚膜。为了避免干燥应力,传统的金属有机沉积过程中会使用 H(CH2)8COOH 等常规防裂化学品。然而,在 TFA-MOD 的煅烧过程中,大量氢原子会与氟原子发生反应,有害碳残留的增加会降低薄膜的超导性。为了避免这种化学反应,我们采用了新型防裂化学品,如 H(CF2)8COOH 来制备单涂层厚膜。低比例的氢原子可减少化学反应并产生氟化氢气体,从而抑制碳残留。在煅烧温度以上,防裂化学物质会分解成低沸点化学物质,如 CF2CF2 或 CF3CF3。因此,实现了单涂层厚膜的低碳残留和足够的单位宽度超导电流。长期以来,作者一直在研究其他可能的候选防裂化学品。新引入的煅烧过程中对分解材料的氟离子测量揭示了防止裂纹化学物质的性质。根据积累的结果,我们得出结论,在一百多万种化学物质中,只有两类适合用 TFA-MOD 制备单涂层厚超导薄膜。一类是氢化全氟羧酸,如 H(CF2)8COOH,另一类是全氟二羧酸。对于 H(CF2)8COOH,我们采用单涂层工艺获得了 560 nm 厚的 YBa2Cu3O6.93 薄膜,其 Jc 为 4.70 MA/cm2(77 K,0T)。与 Jc 为 7.70 MA/cm2 (77 K,0T)的标准 150 nm 厚 YBa2Cu3O6.93 薄膜相比,单位宽度临界电流提高了约 227%。
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来源期刊
Cryogenics
Cryogenics 物理-热力学
CiteScore
3.80
自引率
9.50%
发文量
0
审稿时长
2.1 months
期刊介绍: Cryogenics is the world''s leading journal focusing on all aspects of cryoengineering and cryogenics. Papers published in Cryogenics cover a wide variety of subjects in low temperature engineering and research. Among the areas covered are: - Applications of superconductivity: magnets, electronics, devices - Superconductors and their properties - Properties of materials: metals, alloys, composites, polymers, insulations - New applications of cryogenic technology to processes, devices, machinery - Refrigeration and liquefaction technology - Thermodynamics - Fluid properties and fluid mechanics - Heat transfer - Thermometry and measurement science - Cryogenics in medicine - Cryoelectronics
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