Applicability of energy-theta mapping in resonant soft X-ray reflectometry to probe depth dependence of oxidation state and crystallographic environment in iron oxide multilayers

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2024-09-02 DOI:10.1016/j.tsf.2024.140517
P.A. Dvortsova, S.M. Suturin
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Abstract

In the present paper we discuss applicability of the synchrotron method of resonant x-ray reflectometry to non-destructive depth profiling of multilayer heterostructures with low optical contrast between the sublayers. The two-dimensional mapping approach comprising evaluation and measurement of reflectance as a function of photon energy and grazing angle is shown to provide a convenient way to effectively utilize the enhancement of optical contrast between the sublayers that exists at the absorption edges of chemical elements due to particular spectral shape peculiarities related to oxidation state, crystallographic environment and magnetization. In the present study the evaluation of the resonant X-ray reflectivity maps is performed using a specially developed modeling and fitting software. Estimation of the photon energy / grazing angle combinations at which the reflectance is most sensitive to the minor changes in the physical properties of the sublayers is illustrated by the example of ferroic-on-semiconductor nanoscale heterostructures composed of nanoscale film of metallic iron oxidized from either top or bottom side. The subtle differences in resonant soft x-ray reflectance caused by variation of the oxide film thickness, oxidation state and crystallographic environment are discussed. The presented approach is applicable to a large class of heterostructures composed of sublayers that can be distinguished only by the differences in their near edge X-ray absorption fine structure.

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共振软 X 射线反射仪中的能量-θ 图谱适用于探测氧化铁多层膜中氧化态和结晶环境的深度依赖性
在本文中,我们讨论了同步加速器共振 X 射线反射测量法在对子层间光学对比度较低的多层异质结构进行非破坏性深度剖析时的适用性。二维绘图方法包括评估和测量反射率作为光子能量和掠射角的函数,该方法提供了一种方便的方法,可有效利用化学元素吸收边缘由于与氧化态、结晶环境和磁化有关的特殊光谱形状而存在的亚层间光学对比度的增强。本研究使用专门开发的建模和拟合软件对共振 X 射线反射率图进行评估。以铁基半导体纳米级异质结构为例,说明了在何种光子能量/掠射角组合下,反射率对子层物理性质的微小变化最为敏感。讨论了因氧化膜厚度、氧化态和晶体环境的变化而导致的共振软 X 射线反射率的微妙差异。所提出的方法适用于一大类由子层组成的异质结构,这些子层只能通过其近边缘 X 射线吸收精细结构的差异加以区分。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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